Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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A Study on the Characteristics of Laser Processing in the DLC Thin Film according to Boron Doped Content

보론 도핑 여부에 따른 DLC 박막의 레이저 가공 특성 변화 연구

  • Son, Ye-Jin (Department of Nano Fusion Technology, Pusan National University) ;
  • Choi, Ji-yeon (Department of Laser and Electron Beam Application, Korea Institute of Machinery and Materials (KIMM)) ;
  • Kim, Tae-Gyu (Department of Nanomechatronics Engineering, Pusan National University)
  • 손예진 (부산대학교 나노융합기술학과) ;
  • 최지연 (한국기계연구원 광응용기계연구실) ;
  • 김태규 (부산대학교 나노메카트로닉스공학과)
  • Received : 2019.07.03
  • Accepted : 2019.07.22
  • Published : 2019.07.30
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Abstract

Diamond Like Carbon (DLC) is a metastable form of amorphous carbon that have superior material properties such as high mechanical hardness, chemical inertness, abrasion resistance, and biocompatibility. Furthermore, its material properties can be tuned by additional doping such as nitrogen or boron. However, either pure DLC or doped DLC show poor adhesion property that makes it difficult to apply contact processing technique. Therefore we propose ultrafast laser micromachining which is non-contact precision process without mechanical degradation. In this study, we developed precision machining process of DLC thin film using an ultrafast laser by investigating the process window in terms of laser fluence and laser wavelength. We have also demonstrated various patterns on the film without generating any microcracks and debris.

Keywords

OCRHB6_2019_v32n4_155_f0001.png 이미지

Fig. 2. Raman spectra B-DLC thin films.

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Fig. 3. XPS result of B-DLC film (#4 sample).

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Fig. 4. Schematic diagram of a laser micromachining system and Galvano scanner.

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Fig. 5. Graph of single pulse ablation threshold on B-DLC on the wafer at 1030 nm, 300 fs.

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Fig. 6. Graph of single pulse ablation threshold on B-DLC on the wafer at 343 nm, 300 fs.

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Fig. 7. Optical microscope images of DLC.(a) Non boron doped DLC, (b) Boron doped B-DLC (#3 sample).

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Fig. 8. Optical microscope images of #1 sample.

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Fig. 9. Optical microscope images of #3 sample.

Table 1. B-DLC deposition conditions

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Table 2. Peak position of G peaks and I(D)/I(G) ratio as B-DLC samples

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Table 3. Absorption of B-DLC film on boron ratio

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Table 4. Single pulse ablation threshold of B-DLC on the Si wafer

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References

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