DOI QR코드

DOI QR Code

전산유체역학을 이용한 반도체 제조공정의 PM 전용 후드 설계 연구

Design of local exhaust ventilation for preventive maintenance in semiconductor fabrication industry using CFD

  • 홍좌령 (삼성전자 건강연구소) ;
  • 구재한 (삼성전자 반도체연구소 환경안전그룹) ;
  • 박창섭 (삼성전자 반도체연구소 환경안전그룹) ;
  • 최광민 (삼성전자 건강연구소)
  • Hong, Jwaryung (Samsung Health Research Institute, Samsung Electronics Co. Ltd.) ;
  • Koo, Jae-Han (Environment Safety Health Group, Semiconductor R&D Center, Samsung Electronics Co. Ltd.) ;
  • Park, Chang-Sup (Environment Safety Health Group, Semiconductor R&D Center, Samsung Electronics Co. Ltd.) ;
  • Choi, Kwang-Min (Samsung Health Research Institute, Samsung Electronics Co. Ltd.)
  • 투고 : 2019.04.11
  • 심사 : 2019.05.29
  • 발행 : 2019.06.30

초록

Objective: The aim of this study is to control residual chemicals or by-products generated in chambers during preventive maintenance (PM) in the semiconductor manufacturing industry. We designed local exhaust ventilation using computational fluid dynamics (CFD). Methods: The air flow characteristics and capture efficiency between rectangular and slot hoods were compared numerically. The software Fluent 18.1 was used to estimate uniform velocity distribution and capture efficiency for contaminants. A metal from group 15 in the periodic table was released at the bottom of the chamber to simulate emissions. Results: The slot hood had a higher capture efficiency than a rectangular hood under the same conditions because the slot hood provided uniform air flow and higher face velocity. Also, there was no rotating swirl in the plenum for slot, that is why slot had better efficiency than rectangular even though they had similar face velocity. With less than 10 slots, the capture efficiencies for contaminants were nearly 95%. The optimum conditions for a hood to achieve high efficiency was 8 to 10 slots and a face velocity over 1 m/s. Conclusions: Well-designed ventilation systems must consider both efficiency and convenience. For this study, a slot hood that had high capture efficiency and no work disturbance was designed. This will contribute to protection of the worker's health in a PM area and other areas as well. Also, this study confirms the possibility of the application CFD in the semiconductor fabrication industry.

키워드

SOOSB1_2019_v29n2_208_f0001.png 이미지

Figure 1. Schematic diagram of hood for PM process

SOOSB1_2019_v29n2_208_f0002.png 이미지

Figure 2. Configuration of hood with the grid pattern

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Figure 3. Distribution of velocity

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Figure 4. Velocity vector and contour of rectangular hood

SOOSB1_2019_v29n2_208_f0005.png 이미지

Figure 5. Velocity vector and contour of slot hood

Table 1. Conditions of numerical analysis

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Table 2. Face velocity by location

SOOSB1_2019_v29n2_208_t0002.png 이미지

Table 3. Face velocity and capture efficiency by slot number

SOOSB1_2019_v29n2_208_t0003.png 이미지

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