Journal of Electrochemical Science and Technology

The Korean Electrochemical Society (한국전기화학회)
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Effect of Nanostructures of Au Electrodes on the Electrochemical Detection of As

  • Received : 2018.11.22
  • Accepted : 2018.12.18
  • Published : 2019.06.30
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Abstract

The development of simple methods for As detection has received great attention because As is a toxic chemical element causing environmental and health-related issues. In this work, the effect of nanostructures of Au electrodes on their electroanalytical performance during As detection was investigated. Different Au nanostructures with various surface morphologies such as nanoplate Au, nanospike Au, and dendritic Au structures were prepared, and their electrochemical behaviors toward square-wave anodic stripping voltammetric As detection were examined. The difference in intrinsic efficiency for As detection between nanostructured and flat Au electrodes was explained based on the crystallographic orientations of Au surfaces, as examined by the underpotential deposition of Pb. The most efficient As detection performance was obtained with nanoplate Au electrodes, and the effects of the pre-deposition time and interference on As detection of the nanoplate Au electrodes were also investigated.

Keywords

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Fig. 1. SWASV of the (a) flat Au, (b) nanoplate Au, (c) dendritic Au, and (d) nanospike Au electrodes in 3 μM As(III) + 1 M HCl. The nanostructured Au electrodes were prepared using different deposition charges (Qd).

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Fig. 3. Voltammetric profiles of Pb UPD obtained on (a) flat Au, (b) nanoplate Au, (c) dendritic Au, and (d) nanospike Au in 0.1 M NaOH + 10-3 M Pb(NO3)2. Scan Rate: 50 mV/s.

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Fig. 4. SWASV responses and calibration plots for As detection with (a, b) the flat Au, (c, d) the nanoplate Au (0.019 C), (e, f) the dendritic Au (0.025 C), and (g, h) the nanospike Au (0.02 C) electrodes.

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Fig. 5. SWASV of the effect of pre-deposition time on stripping peak current in 3 μM As(III) in 1 M HCl solution (a) at flat Au and (b) at a nanoplate Au (0.019 C) electrodes. Plot (c) is the stripping peak current vs. predeposition time that shows a comparison of the responses in nanoplate Au and flat Au electrodes.

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Fig. 6. Calibration plots of As detection obtained from flat Au and nanoplate Au electrodes with pre-deposition times of (a) 50 s, (b) 150 s, and (c) 400 s.

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Fig. 7. SWASV responses of the nanoplate Au electrode in the (a) absence and (b) presence of 3 μM Cu(II) in 1 M HCl solution. Pre-deposition time = 150 s.

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Fig. 2. Plot of normalized current vs. deposition charge of nanostructured Au electrodes in 3 μM As(III) in 1 M HCl. Dashed line corresponds to the flat Au electrode.

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