References
- Hohnke, D. K., Schmatz, D. J., and Hurley, M.D., "(2002) Reactive sputter deposition: A quantitative analysis," Thin Solid Films, Vol. 118, pp. 301-310, 1984. https://doi.org/10.1016/0040-6090(84)90201-3
- Affinito, J. D., Gross, M. E., Coronado, C. A., Graft, G. L., Greenwell, I., and Martin, P. M., "A new method for fabricating transparent barrier layers," Thin Solid Films, Vol. 290-291, pp. 63-67, 1996. https://doi.org/10.1016/S0040-6090(96)09202-4
- Carter, D., Walde, H., McDonough, G., and Roche, G., "Parameter optimization in pulsed DC reactive sputter deposition of aluminum oxide," Soc. Vac. Coaters, Vol. 505, pp. 570-577, 2002.
- Berg, S., and Nyberg, T., "Fundamental understanding and modeling of reactive sputtering processes," Thin Solid Films, Vol. 476, pp. 215-230, 2005. https://doi.org/10.1016/j.tsf.2004.10.051
- Anders, A., "Physics of arcing, and implications to sputter deposition," Thin Solid Films, Vol. 502, pp. 22-28, 2006. https://doi.org/10.1016/j.tsf.2005.07.228
- Depla, D., and De Gryse, R., "Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering," Surf. Coat. Technol., Vol. 183, pp. 190-195, 2004. https://doi.org/10.1016/j.surfcoat.2003.10.007
-
Lee, J. Y., Kim, D. W., Kang, W. S., Lee, J. O., Hur, M., and Han, S. H., "Growth mechanism of
$Al_2O_3$ film on an organic layer in plasma-enhanced atomic layer deposition," J. Phys. D, Vol. 51, pp. 015201 1-9, 2018. https://doi.org/10.1088/1361-6463/aa9941 -
Carcia, P. F., McLean, R. S., Groner, M. D., Dameron, A. A., and George, S. M., "Gas diffusion ultrabarriers on polymer substrates using
$Al_2O_3$ atomic layer deposition and SiN plasma-enhanced chemical vapor deposition," J. Appl. Phys., Vol. 106, pp. 023533 1-6, 2009. https://doi.org/10.1063/1.3159639 -
Paek, S. H., Kim, I. S., Cheon, J. Y., and Chun, H. G., "Interfacial Microstructure and Electrical Properties of
$Al_2O_3$ /Si Interface of Mono-crystalline Silicon Solar Cells," J. of The Korean Society of Semiconductor & Display Technology, Vol. 12, pp. 41-46, 2013. -
Haeberle, J., Henkel, K., Gargouri, H., Naumann, F., Gruska, B., Arens, M., Tallarida, M., and Schmeisser, D., "Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited
$Al_2O_3$ -films," Beilstein J. Nanotechnol., Vol. 4, pp. 732-742, 2013. https://doi.org/10.3762/bjnano.4.83 - Stankovich, S., Piner, R. D., Chen, X., Wu, N., Nguyen, S. T., and Ruoff, R. S., "Stable aqueous dispersions of graphitic nanoplatelets via the reduction of exfoliated graphite oxide in the presence of poly(sodium 4-styrenesulfonate)," J. Mater. Chem., Vol. 16, pp 155-158, 2006. https://doi.org/10.1039/B512799H