Fig. 1. Measurement method of capacitance of composite devices.
Fig. 2. XRD patterns of graphene oxide, and fluoro graphene oxide.
Fig. 3. Capacitance value according to pressure applied to composite devices [(a)-thickness 5 um, (b) thickness 15 um, and (c) thickness 30 um].
Fig. 4. The role of the gaphene oxide in the dielectric substance.
Fig. 5. Capacitance value as a result of depressurization by the amount of graphene oxide [(a) press 100 g, (b) press 300 g, and (c) press 500 g].
Fig. 6. SEM images of dielectric substance (a) fluorine, (b) F-GO Fig. 6. SEM images of dielectric substance (a) fluorine, (b) F-GO
Fig. 7. Pressure limit characteristics according to film thickness.
Fig. 8. Current variation of F-GO (1:2) with applied voltage.
Fig. 9. Current response time for pressure and graphene oxide ratio.
Table 1. Conditions for the evaluation of characteristics of F, F-GO.
Table 2. Conditions for the evaluation of characteristics of F, F-GO.
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