Acknowledgement
Supported by : National Research Foundation of Korea (NRF)
References
- T. Kamiya, K. Nomura, H. Hosono, Sci. Technol. Adv. Mater. 11 (2010) 1.
- E. Fortunato, P. Barquinha, R. Martins, Adv. Mater. 24 (2012) 2945. https://doi.org/10.1002/adma.201103228
- S. Kim, Y.J. Choi, Y. Choi, M.S. Kang, J.H. Cho, Adv. Funct. Mater. 27 (2017) 1700651. https://doi.org/10.1002/adfm.201700651
- X.G. Yu, T.J. Marks, A. Facchetti, Nat. Mater. 15 (2016) 383. https://doi.org/10.1038/nmat4599
- B.N. Pal, B.M. Dhar, K.C. See, H.E. Katz, Nat. Mater. 8 (2009) 898. https://doi.org/10.1038/nmat2560
- J.W. Jo, Y.H. Kim, J. Park, J.S. Heo, S. Hwang, W.J. Lee, M.H. Yoon, M.G. Kim, S.K. Park, ACS Appl. Mater. Interfaces 9 (2017) 35114. https://doi.org/10.1021/acsami.7b09523
- M.G. Kim, M.G. Kanatzidis, A. Facchetti, T.J. Marks, Nat. Mater. 10 (2011) 382. https://doi.org/10.1038/nmat3011
- G.R. Hong, S.S. Lee, Y. Jo, M.J. Choi, Y.C. Kang, B.H. Ryu, K.B. Chung, Y. Choi, S. Jeong, ACS Appl. Mater. Interfaces 8 (2016) 29858. https://doi.org/10.1021/acsami.6b08950
- J.H. Park, K. Kim, Y.B. Yoo, S.Y. Park, K.H. Lim, K.H. Lee, H.K. Baik, Y.S. Kim, J. Mater. Chem. C 1 (2013) 7166. https://doi.org/10.1039/c3tc31589d
- J. Kim, S.H. Lim, Y.S. Kim, J. Am. Chem. Soc. 132 (2010) 14721. https://doi.org/10.1021/ja104840b
- S. Park, C.H. Kim, W.J. Lee, S. Sung, M.H. Yoon, Mater. Sci. Eng. R 114 (2017) 1. https://doi.org/10.1016/j.mser.2017.01.003
- K.K. Banger, Y. Yamashita, K. Mori, R.L. Peterson, T. Leedham, J. Rickard, H. Sirringhaus, Nat. Mater. 10 (2011) 45. https://doi.org/10.1038/nmat2914
- S.T. Meyers, J.T. Anderson, C.M. Hung, J. Thompson, J.F. Wager, D.A. Keszler, J. Am. Chem. Soc. 130 (2008) 17603. https://doi.org/10.1021/ja808243k
- Y. Hwan Hwang, J.-S. Seo, J. Moon Yun, H. Park, S. Yang, S.-H. Ko Park, B.-S. Bae, NPG Asia Mater. 5 (2013)e45. https://doi.org/10.1038/am.2013.11
- K.H. Lim, J.E. Huh, J. Lee, N.K. Cho, J.W. Park, B.I. Nam, E. Lee, Y.S. Kim, ACS Appl. Mater. Interfaces 9 (2017) 548. https://doi.org/10.1021/acsami.6b11867
- P.N. Plassmeyer, G. Mitchson, K.N. Woods, D.C. Johnson, C.J. Page, Chem. Mater. 29 (2017) 2921. https://doi.org/10.1021/acs.chemmater.6b05200
- K.H. Lee, J.H. Park, Y.B. Yoo, S.W. Han, S.J. Lee, H.K. Baik, Appl. Phys. Express 8 (2015) 081101. https://doi.org/10.7567/APEX.8.081101
- K.H. Lee, S.W. Han, J.H. Park, Y.B. Yoo, S.J. Lee, H.K. Baik, K.M. Song, Jpn. J. Appl. Phys. 55 (2016) 010304. https://doi.org/10.7567/JJAP.55.010304
- J.S. Seo, J.H. Jeon, Y.H. Hwang, H. Park, M. Ryu, S.H.K. Park, B.S. Bae, Sci. Rep. 3 (2013) 3.
- H. Faber, Y.H. Lin, S.R. Thomas, K. Zhao, N. Pliatsikas, M.A. McLachlan, A. Amassian, P.A. Patsalas, T.D. Anthopoulos, ACS Appl. Mater. Interfaces 7 (2015) 782. https://doi.org/10.1021/am5072139
- Y.S. Rim, H. Chen, T.-B. Song, S.-H. Bae, Y. Yang, Chem. Mater. 27 (2015) 5808. https://doi.org/10.1021/acs.chemmater.5b02505
- A. Liu, G. Liu, H. Zhu, B. Shin, E. Fortunato, R. Martins, F. Shan, RSC Adv. 5 (2015) 86606. https://doi.org/10.1039/C5RA15370K
- W. Xu, H. Cao, L. Liang, J.B. Xu, ACS Appl. Mater. Interfaces 7 (2015) 14720. https://doi.org/10.1021/acsami.5b02451
- G. Liu, A. Liu, H. Zhu, B. Shin, E. Fortunato, R. Martins, Y. Wang, F. Shan, Adv. Funct. Mater. 25 (2015) 2564. https://doi.org/10.1002/adfm.201500056
- A. Liu, G.X. Liu, H.H. Zhu, H.J. Song, B. Shin, E. Fortunato, R. Martins, F.K. Shan, Adv. Funct. Mater. 25 (2015) 7180. https://doi.org/10.1002/adfm.201502612
- F.-C. Chiu, Adv. Mater. Sci. Eng. 2014 (2014) 1.
- A. Hasegawa, T. Tanno, S. Nogami, M. Satou, J. Nucl. Mater. 417 (2011) 491. https://doi.org/10.1016/j.jnucmat.2010.12.114
- R.A. Alberty, J. Biol. Chem. 244 (1969) 3290.
- T. Urabe, T. Tsugoshi, M. Tanaka, J. Mass Spectrom. 44 (2009) 193. https://doi.org/10.1002/jms.1485
- A. Sarpola, V. Hietapelto, J. Jalonen, J. Jokela, R.S. Laitinen, J. Ramo, J. Mass Spectrom. 39 (2004) 1209. https://doi.org/10.1002/jms.722
- B. Brauer, D.R.T. Zahn, T. Ruffer, G. Salvan, Chem. Phys. Lett. 432 (2006) 226. https://doi.org/10.1016/j.cplett.2006.10.070
- N. Haque, R.F. Cochrane, A.M. Mullis, Crystals 7 (2017).
- H.D. Keith, F.J. Padden, J. Appl. Phys. 34 (1963) 2409. https://doi.org/10.1063/1.1702757
- A.G. Shtukenberg, Y.O. Punin, E. Gunn, B. Kahr, Chem. Rev. 112 (2012) 1805. https://doi.org/10.1021/cr200297f
- E. Gunn, Small Molecule Banded Spherulites (Ph.D. Dissertation), University of Washington Seattle, Washington, USA, 2009.
- R.R. Hegde, J.E. Spruiell, G.S. Bhat, Polym. Int. 63 (2014) 1112. https://doi.org/10.1002/pi.4623
- Y. Wang, X.F. Liu, J. Peng, F. Qiu, RSC Adv. 5 (2015) 107970. https://doi.org/10.1039/C5RA24266E
- L.G.M. Beekmans, G.J. Vancso, Polymer 41 (2000) 8975. https://doi.org/10.1016/S0032-3861(00)00240-8
- M.R. Niazi, R. Li, Qiang Li, A.R. Kirmani, M. Abdelsamie, Q. Wang, W. Pan, M.M. Payne, J.E. Anthony, D.M. Smilgies, S.T. Thoroddsen, E.P. Giannelis, A. Amassian, Nat. Commun. 6 (2015) 8598. https://doi.org/10.1038/ncomms9598
- E. Woo, G. Lugito, Polymers 8 (2016) 329. https://doi.org/10.3390/polym8090329
- C. Zhang, L. Lu, W. Li, L. Li, C. Zhou, Polym. Bull. 73 (2016) 2961. https://doi.org/10.1007/s00289-016-1634-2
- V. Viswanath, S. Maity, J.R. Bochinski, L.I. Clarke, R.E. Gorga, Macromolecules 46 (2013) 8596. https://doi.org/10.1021/ma401855v
- M. Egginger, S. Bauer, R. Schwodiauer, H. Neugebauer, N.S. Sariciftci, Monatsh. Chem. Chem. Mon. 140 (2009) 735. https://doi.org/10.1007/s00706-009-0149-z
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