반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

임피던스 변화를 이용한 선형 대기압 DBD 플라즈마 밀도 측정

Plasma Density Measurement of Linear Atmospheric Pressure DBD Source Using Impedance Variation Method

  • 신기원 (광운대학교 전자바이오물리학과) ;
  • 이환희 (광운대학교 전자바이오물리학과) ;
  • 권희태 (광운대학교 전자바이오물리학과) ;
  • 김우재 (광운대학교 전자바이오물리학과) ;
  • 서영철 (영신알에프(주)) ;
  • 권기청 (광운대학교 전자바이오물리학과)
  • Shin, Gi Won (Kwangwoon University Dept. of Electrical and Biological Physics) ;
  • Lee, Hwan Hee (Kwangwoon University Dept. of Electrical and Biological Physics) ;
  • Kwon, Hee Tae (Kwangwoon University Dept. of Electrical and Biological Physics) ;
  • Kim, Woo Jae (Kwangwoon University Dept. of Electrical and Biological Physics) ;
  • Seo, Young Chul (YOUNGSIN-RF CO.,Ltd.) ;
  • Kwon, Gi-Chung (Kwangwoon University Dept. of Electrical and Biological Physics)
  • 투고 : 2018.05.28
  • 심사 : 2018.06.20
  • 발행 : 2018.06.30
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초록

The development speed of semiconductor and display device manufacturing technology is growing faster than the development speed of process equipment. So, there is a growing need for process diagnostic technology that can measure process conditions in real time and directly. In this study, a plasma diagnosis was carried out using impedance variation due to the plasma discharge. Variation of the measurement impedance appears as a voltage change at the reference impedance, and the plasma density is calculated using this. The above experiment was conducted by integrating the plasma diagnosis system and the linear atmospheric pressure DBD plasma source. It was confirmed that plasma density varies depending on various parameters (gas flow rate, $Ar/O_2$ mixture ratio, Input power).

키워드

참고문헌

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