Journal of Electrical Engineering and Technology

  • 제12권5호
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  • Pages.2007-2013
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  • 2017
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  • 1975-0102(pISSN)
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  • 2093-7423(eISSN)
대한전기학회 (The Korean Institute of Electrical Engineers)
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The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma

  • Han, Moon-Ki (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Cha, Ju-Hong (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Lee, Ho-Jun (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Chang, Cheol Jong (Productivity Research Institute, LG Electronics) ;
  • Jeon, Chang Yeop (Productivity Research Institute, LG Electronics)
  • 투고 : 2017.02.22
  • 심사 : 2017.04.18
  • 발행 : 2017.09.01
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초록

In order to give hydrophobic surface properties on carbon steel, the fluorinated amorphous carbon films were prepared by using linear 2.45GHz microwave PECVD device. Two different process approaches have been tested. One is direct deposition of a-C:H:F films using admixture of $Ar/CH_4/CF_4$ working gases and the other is surface treatment using $CF_4$ plasma after deposition of a-C:H film with $Ar/CH_4$ binary gas system. $Ar/CF_4$ plasma treated surface with high $CF_4$ gas ratio shows best hydrophobicity and durability of hydrophobicity. Nanometer scale surface roughness seems one of the most important factors for hydrophobicity within our experimental conditions. The properties of a-C:H:F films and $CF_4$ plasma treated a-C:H films were investigated in terms of surface roughness, hardness, microstructure, chemical bonding, atomic bonding structure between carbon and fluorine, adhesion and water contact angle by using atomic force microscopy (AFM), nano-indentation, Raman analysis and X-ray photoelectron spectroscopy (XPS).

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참고문헌

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