• Title/Summary/Keyword: a-C:H:F

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Semiempirical Estimation of Standard Enthalpy of Formation for Halogen Substituted Hydrocarbons (할로겐화합물의 표준생성열의 계산)

  • Kwang Yul Choo;Pil Heui Lee
    • Journal of the Korean Chemical Society
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    • v.24 no.2
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    • pp.108-114
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    • 1980
  • By using electrostatic model and simple bond additivity scheme a reasonable and simple method was developed for the estimation of standard enthalpy of formation $({\Delta}H_f\;^{\circ})$ of very polar compounds. The bond contributions to the enthalpy of formation for halomethanes were; ${\Delta}H_f\;^{\circ}(C-F)=-36.44\;kcal/mole,\;{\Delta}H_f\;^{\circ}(C-Cl)=-2.57\;kcal/mole,\;{\Delta}H_f\;^{\circ}(C-Br)=5.32\;kcal/mole,\;{\Delta}H_f\;^{\circ}(C-I)=19.18\;kcal/mole,\;and\;{\Delta}H_f\;^{\circ}(C-H)=-3.61\;kcal/mole$, respectively. Using these values and calculated electrostatic energies, the estimated ${\Delta}H_f\;^{\circ}$ values were estimated and found to be in good agreement with observed values.

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Effect of gas composition on the characteristics of a-C:F thin films for use as low dielectric constant ILD (가스 조성이 저유전상수 a-C:F 층간절연막의 특성에 미치는 영향)

  • 박정원;양성훈;이석형;손세일;오경희;박종완
    • Journal of the Korean Vacuum Society
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    • v.7 no.4
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    • pp.368-373
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    • 1998
  • As device dimensions approach submicrometer size in ULSI, the demand for interlayer dielectric materials with very low dielectric constant is increased to solve problems of RC delay caused by increase in parasitic resistance and capacitance in multilevel interconnectins. Fluorinated amorphous carbon in one of the promising materials in ULSI for the interlayer dielectric films with low dielectric constant. However, poor thermal stability and adhesion with Si substrates have inhibited its use. Recently, amorphous hydrogenated carbon (a-C:H) film as a buffer layer between the Si substrate and a-C:F has been introduced because it improves the adhesion with Si substrate. In this study, therfore, a-C:F/a-C:H films were deposited on p-type Si(100) by ECRCVD from $C_2F_6, CH_4$and $H_2$gas source and investigated the effect of forward power and composition on the thickness, chemical bonding state, dielectric constant, surface morphology and roughness of a-C:F films as an interlayer dielectric for ULSI. SEM, FT-IR, XPS, C-V meter and AFM were used for determination of each properties. The dielectric constant in the a-C:F/a-C:H films were found to decrease with increasing fluorine content. However, the dielectric constant increased after furnace annealing in $N_2$atomosphere at $400^{\circ}C$ for 1hour due to decreasing of flurorine content. However, the dielectric constant increased after furnace annealing in $N_2$atmosphere at $400^{\circ}C$ for 1hour due to decreasing of fluorine concentration.

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Study on Environmental Hazards of Alternatives for PFOS (PFOS 대체물질의 환경유해성에 관한 연구)

  • Choi, Bong-In;Chung, Seon-Yong;Na, Suk-Hyun;Shin, Dong-Soo;Ryu, Byung-Taek
    • Journal of Korean Society of Environmental Engineers
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    • v.38 no.6
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    • pp.317-322
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    • 2016
  • While PFOS sodium salt ($C_8F_{17}SO_3Na$) was not degraded by microorganisms for 28 days, the 4 alternatives were biodegraded at the rates of 21.6% for $C_{25}F_{17}H_{32}S_3O_{13}Na_3$, 20.5% for $C_{15}F_9H_{21}S_2O_8Na_2$, 15.8% for $C_{23}F_{18}H_{28}S_2O_8Na_2$ and 6.4% for $C_{17}F_9H_{25}S_2O_8Na_2$, respectively. The acute toxicity test using Daphnia magna was conducted for 48 hours, the half effective concentration ($EC_{50}$) of PFOS sodium salt ($C_8F_{17}SO_3Na$) was evaluated in 54.5 mg/L. While the 4 alternatives did not show any effect at 500.0 mg/L. The surface tension of the PFOS salt ($C_8F_{17}SO_3Na$) is 46.2 mN/m at a concentration of 500.0 mg/L. While the surface tension of the 4 alternatives was found to be superior to PFOS sodium salt ($C_8F_{17}SO_3Na$). The surface tension of $C_{23}F_{18}H_{28}S_2O_8Na_2$ (20.9 mN/m) has the lowest, followed by $C_{15}F_9H_{21}S_2O_8Na_2$ (23.4 mN/m), $C_{17}F_9H_{25}S_2O_8Na_2$ (27.3 mN/m), $C_{25}F_{17}H_{32}S_3O_{13}Na_3$ (28.2 mN/m). The four kinds of alternatives ($C_{15}F_9H_{21}S_2O_8Na_2$, $C_{17}F_9H_{25}S_2O_8Na_2$, $C_{23}F_{18}H_{28}S_2O_8Na_2$, $C_{25}F_{17}H_{32}S_3O_{13}Na_3$) were found to be superior to PFOS sodium salt ($C_8F_{17}SO_3Na$) in terms of biodegradation, Daphnia sp. acute toxicity and surface tension, and thus they were considered applicable as PFOS alternatives. Especially biodegradation rate of $C_{15}F_9H_{21}S_2O_8Na_2$, $C_{23}F_{18}H_{28}S_2O_8Na_2$ and $C_{25}F_{17}H_{32}S_3O_{13}Na_3$ was relatively high as 15.8~21.6%, and Daphnia sp. acute toxicity and surface tension were considerably superior (surface tension 39~55%) to PFOS sodium salt. Therefore, these alternatives are considered to be available as an alternative of PFOS.

Ab Initio Studies on the $(HF)_2(CO)$ Trimers ($(HF)_2(CO)$ 분자착물에 관한 Ab Initio 연구)

  • Kim, Seung Hoon
    • Journal of the Korean Chemical Society
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    • v.42 no.6
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    • pp.629-637
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    • 1998
  • The HF-SCF, MP2 and B3LYP calculations have been performed on the two conceivable clusters $(HF)_2(CO)$ trimers as well as their dimer complexes FH…FH, FH…CO and FH…OC applying $6-31+G^{\ast}^{\ast}$, and $6-311+G^{\ast}^{\ast}$ basis sets. A variety of ground state properties of these trimer complexes have been listed, and compared with corresponding properties of isolated monomers and combined dimers. It was calculated that FH…CO is more stable than FH…OC by average 0.85 kcal/mol and F-H…F-H…C≡O is more stable than F-H…F-H…O≡C by 1-2 kcal/mol. The C≡O stretching bands of the F-H…F-H…C≡O and F-H…F-H…O≡C were red shifted by 24, $37\;cm^{-1}$ compared with the FH…CO and FH…OC respectively. Also, H-F stretching bands were red shifted by 54 and $353\;cm^{-1}$.

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Biodegradation test of the alternatives of perfluorooctanesulfonate (PFOS) and PFOS salts (PFOS salts 및 PFOS 대체물질에 대한 미생물분해시험)

  • Choi, Bong-In;Na, Suk-Hyun;Son, Jun-hyo;Shin, Dong-Soo;Ryu, Byung-taek;Chung, Seon-yong
    • Journal of Environmental Health Sciences
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    • v.42 no.2
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    • pp.112-117
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    • 2016
  • Objectives: In this study, we investigated the biodegradation rates of 8 perfluorooctanesulfonate (PFOS) alternatives synthesized at the at Changwon National University in comparison to those of PFOS potassium salt and PFOS sodium salt. Methods: A biodegradability test was performed for 28 days with microorganisms cultured in the good laboratory practice laboratory at the Korea Environment Corporation following the OECD Guidelines for the testing of chemicals, Test No. 301 C Results: While $C_5H_8F_3SO_3K$, $C_8F_{17}SO_3K$ and $C_8F_{17}SO_3Na$ were not degraded after 28 days, the 3 alternatives were biodegraded at the rates of 31.4% for $C_8H_8F_9SO_3K$, 25.6% for $C_{10}H_8F_{13}SO_3K$, 23.6% for $C_{25}F_{17}H_{32}S_3O_{13}Na_3$, 20.9% for $C_{15}F_9H_{21}S_2O_8Na_2$, 15.5% for $C_{23}F_{18}H_{28}S_2O_8Na_2$, 8.5% for $C_{17}F_9H_{25}S_2O_8Na_2$ and 4.8% for $C_6H_8F_5SO_3K$. When the concentration was the same(500 mg/L), $C_{23}F_{18}H_{28}S_2O_8Na_2$ had the lowest tension with 20.94 mN/m, which was followed by $C_{15}F_9H_{21}S_2O_8Na_2$ (23.36 mN/m), $C_{17}F_9H_{25}S_2O_8Na_2$ (27.31 mN/m), $C_{25}F_{17}H_{32}S_3O_{13}Na_3$ (28.17 mN/m), $C_{10}H_8F_{13}SO_3K$ (29.77 mN/m) and $C_8H_8F_9SO_3K$ (33.89 mN/m). Having higher surface tension of 57.64 mN/m and 67.57 mN/m, respectively, than those of the two types of PFOS salts, $C_6H_8F_5SO_3K$ and $C_5H_8F_3SO_3K$ were found valueless as substitute for PFOS. Conclusion: The biodegradation test suggest that 6 compounds could be used as substitutes for PFOS. $C_{23}F_{18}H_{28}S_2O_8Na_2$ and $C_{15}F_9H_{21}S_2O_8Na_2$ were found to be the best substitutes based on biodegradation rate and surface tension, followed by $C_{25}F_{17}H_{32}S_3O_{13}Na_3$, $C_8H_8F_9SO_3K$ and $C_{10}H_8F_{13}SO_3K$. $C_{17}F_9H_{25}S_2O_8Na_2$ was found to have relatively low value as an alternative but it still had a potential to substitute the conventional PFOS.

Purification and Characterization of Cellulolytic Enzymes from Aspergillus niger (Aspergillus niger가 생산(生産)하는 섬유소(纖維素) 분해효소(分解酵素)의 정제(精製) 및 특성(特性))

  • Park, Kwan-Hwa;Oh, Tae-Kwang;Shin, Jae-Doo
    • Applied Biological Chemistry
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    • v.24 no.3
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    • pp.186-193
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    • 1981
  • Three fractions of carboxymethyl-cellulase (F-I, F-II, and F-III) and ${\beta}-glucosidase$ form Aspergillus niger were partially purified by ammonium sulfate fractionation. Sephadex G-150 and DEAE-Sephadex column chromatography. The optimum conditions such as pH and temperature and thermal inactivation properties of the enzymes were investigated. Arrhenius plots of F-II and F-III appeared as straight lines, whereas that of F-I was biphasic. The Z-values of F-II and F-III were $8^{\circ}C$ and $10^{\circ}C$ respectively, while that of F-I was $4^{\circ}C$ over $60{\sim}70^{\circ}C$ and $383^{\circ}C$ over $70{\sim}98^{\circ}C$. Three fractions and the crude extract of carboxymethyl-cellulase exhibited a similar optimum pH 4.3 and temperature of $60^{\circ}C$, while Z-value of crude extract $(21.5^{\circ}C)$ was much higher than that of the purified enzyme. Maximum activity of both purified and crude extract of ${\beta}-glucosidase$ was shown at pH 4.7 and $60^{\circ}C$, and z-value of the enzyme was $7^{\circ}C$.

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A study on the formation and removal of residue and damaged layer on the overched silicon surface during the contact oxide etching using $C_4$F$_8$/H$_2$ helicon were plasmas (C$_4$F$_8$/H$_2$ helicon were 플라즈마를 이용한 contact 산화막 식각 공정시 과식화된 실리콘 표면의 잔류막과 손상층 형성 및 이의 제거에 관항 연구)

  • 김현수;이원정;백종태;염근영
    • Journal of the Korean institute of surface engineering
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    • v.31 no.2
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    • pp.117-126
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    • 1998
  • In this study, the residue remaining on the silicon wafer during the oxide overetching using $C_4F_8/H_2$ helicon were plasmas and effects of various cleaning and annealing methods on the removal of the remaining residue were investigated. The addition of 30%$H_2$ to the C4F8 plasma increased the C/F ratio and the thickness of the residue on the etched silicon surface. Most of the residuse on the etched surfaces colud be removed by the oxygen plasmsa cleaning followed by thermal annealing over $450^{\circ}C$. Hydrogen-coataining residue formed on the silicon by 70%$C_4F_8/30%H_2$ helicon plasmas was more easily removed than hydrogen-free residue formed residue formed by $C_4F_8$ helicon wear plasmas. However, damage remaining on the silicon surface overetched using 70%$C_4F_8/30%H_2$ helicon plasmas was intensive and the degree of reocvery duing the post-annealing was lower.

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A optimum studies of TCO/p-layer for high Efficiency in Amorphous Silicon Solar cell (비정질 실리콘 태양전지 고효율화를 위한 전면투명전도막/p 최적연구)

  • Lee, Ji-Eun;Lee, Jeong-Chul;Oh, Byung-Seng;Song, Jin-Soo;Yoon, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2007.11a
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    • pp.275-277
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    • 2007
  • 유리를 기판으로 하는 superstrate pin 비정질 태양전지에서 전면투명전도막(TCO)과 p-layer의 계면이 태양전지의 효율을 내는데 가장 큰 기여를 한다. 전면투명전도막(TCO)으로 현재 일반적으로 사용되는 ZnO:Al는 $SnO_2:F$ 보다 전기,광학적으로 우수하고, 안개율(Haze)높으며, 수소 플라즈마에서의 안정성이 높은 특정을 갖고 있다. 그래서 박막 태양전지 특성향상에 매우 유리하나, 태양전지로 제조했을 때, $SnO_2:F$보다 충진율(Fill factor:F.F)과 V_{\infty}$ 가 감소한다는 단점을 가지고 있다. 본 실험실에서는 $SnO_2:F$의 F.F가 72%이 나온 반면 ZnO:Al의 F.F은 68%에 그쳤다. 이들 원인을 분석하기 위해 TCO/p-layer의 전기적 특성을 알아 본 결과, $SnO_2:F$보다 ZnO:Al의 직렬저항이 높게 측정되었다. 이러한 결과를 바탕으로 p-layer 에 R={$H_2/SiH_4$}=25로 변화, p ${\mu$}c$-Si:H/p a-SiC:H 로 p-layer 이중 증착, p-layer의 boron doping 농도를 증가시키는 실험을 하였다. 직렬저항이 가장 낮았던 p ${\mu$}c$-Si:H/p a-SiC:H 로 p-layer 이중 증착에서 Voc는 0.95V F.F는 70% 이상이 나왔다. 이들 각 p층의 $E_a$(Activation Energy)를 구해본 결과, ${\mu$}c$-Si:H의 Ea 가 가장 낮은 것을 관찰 할 수 있었다.

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The characteristic analysis of TCO/p-layer interface in Amorphous Silicon Solar cell (비정질 실리콘 태양전지에서 투명전도막/p층 계면 특성분석)

  • Lee, Ji-Eun;Lee, Jeong-Chul;O, Byung-Sung;Song, Jin-Soo;Yoon, Kyung-Hoon
    • New & Renewable Energy
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    • v.3 no.4
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    • pp.63-68
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    • 2007
  • 유리를 기판으로 하는 superstrate pin 비정질 실리콘 태양전진에서 전면 투명전도막(TCO)과 p-층의 계면은 태양전지 변환효율에 큰 영향을 미친다. 면투명전도막(TCO)으로 현재 일반적으로 사용되는 ZnO:Al는 $SnO_2:F$보다 전기, 광학적으로 우수하고, 안개율 (Haze)높으며, 수소 플라즈마에서 안정성이 높은 특징을 갖고 있다. 그래서 박막 태양전지의 특성향상에 매우 유리하나, 태양전지로 제조했을 때, $SnO_2$보다 충진율(Fill Factor:F.F)과 $V_{oc}$가 감소한다는 단점을 가지고 있다. 본 실험실에서는 $SnO_2:F$dml F.F.가 72%이 나온 반면 ZnO:Al의 F.F은 68%에 그쳤다. 이들 원인을 분석하기 위해 TCO/p-layer의 전기적 특성을 알아 본 결과, $SnO_2:F$보다 ZnO:Al의 직렬저항이 높게 측정되었다. 이러한 결과를 바탕으로 p-layer에 $R=(H_2/SiH_4)=25$로 변화, p ${\mu}c$-Si:H/p a-SiC:H로 p-layer 이중 증착, p-layer의 boron doping 농도를 증가시키는 실험을 하였다. 직렬저항이 가장 낮았던 p ${\mu}c$-Si:H/p a-SiC:H 인 p-layer 이중 증착에서 $V_{oc}$는 0.95V F.F는 70%이상이 나왔다. 이들 각 p층의 $E_a$(Activiation Energy)를 구해본 결과, ${\mu}c$-Si:H의 Ea 가 가장 낮은 것을 관찰 할 수 있었다.

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Structure and Bonding of Ni(C6H4-nFn)(CO)2 (C6H4=benzyne, n=1-4) Complexes (Ni(C6H4-nFn)(CO)2 (C6H4=benzyne, n=1-4) 착물의 구조 및 화학결합)

  • Ghiasi, Reza;Hashemian, Saeedeh;Irajee, Oranoos
    • Journal of the Korean Chemical Society
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    • v.55 no.2
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    • pp.183-188
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    • 2011
  • The electronic structure and properties of Ni$(C_6H_{4-n}F_n)(CO)_2$ ($C_6H_4$=benzyne, n=1-4) complexes have been investigated using hybrid density functional B3LYP theory. Both aromatic natures and nucleus independent chemical shift (NICS) of the benzyne rings have been analyzed. Among mono-, di-, and tri-fluorinated complexes, 3-F, 3,6-F, and 4-H are the most stable isomers, respectively. NICS values calculated at the several points above the ring centers are consistent with those based on the relative energies of the complexes. The atoms in molecules (AIM) analysis indicates that Ni-C bond distance is well correlated with the electron density of a ring critical point (${\rho}_{rcp}$) in all species.