Journal of Electrical Engineering and Technology

The Korean Institute of Electrical Engineers (대한전기학회)
권호 표지
DOI QR코드

DOI QR Code

The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma

  • Han, Moon-Ki (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Cha, Ju-Hong (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Lee, Ho-Jun (Dept. of Electrical and Computer Engineering, Pusan National University) ;
  • Chang, Cheol Jong (Productivity Research Institute, LG Electronics) ;
  • Jeon, Chang Yeop (Productivity Research Institute, LG Electronics)
  • Received : 2017.02.22
  • Accepted : 2017.04.18
  • Published : 2017.09.01
Download PDF
⟨ Previous Next ⟩

Abstract

In order to give hydrophobic surface properties on carbon steel, the fluorinated amorphous carbon films were prepared by using linear 2.45GHz microwave PECVD device. Two different process approaches have been tested. One is direct deposition of a-C:H:F films using admixture of $Ar/CH_4/CF_4$ working gases and the other is surface treatment using $CF_4$ plasma after deposition of a-C:H film with $Ar/CH_4$ binary gas system. $Ar/CF_4$ plasma treated surface with high $CF_4$ gas ratio shows best hydrophobicity and durability of hydrophobicity. Nanometer scale surface roughness seems one of the most important factors for hydrophobicity within our experimental conditions. The properties of a-C:H:F films and $CF_4$ plasma treated a-C:H films were investigated in terms of surface roughness, hardness, microstructure, chemical bonding, atomic bonding structure between carbon and fluorine, adhesion and water contact angle by using atomic force microscopy (AFM), nano-indentation, Raman analysis and X-ray photoelectron spectroscopy (XPS).

Keywords

References

  1. Golap Kalita, Hare Ram Aryal, Sudip Adhikari, Dilip C. Ghimire, Rakesh A. Afre, Tetsuo Soga, Maheshwar Sharon and Masayoshi Umeno, "Fluorine incorporated amorphous carbon thin films prepared by Surface Wave Micro-wave Plasma CVD," Diamond & Related Materials 17, pp. 1697-1701, 2008. https://doi.org/10.1016/j.diamond.2008.02.002
  2. J. Podder, M. Rusop T. Soga and T. Jimbo, "Boron doped amorphous carbon thin films grown by r.f. PECVD under different partial pressure," Diamond & Related Materials 14, pp. 1799-1804, 2005. https://doi.org/10.1016/j.diamond.2005.07.020
  3. Ashraf M.M. Omer, Sudip Adhikary, Sunil Adhikary, Mohamad Rusop, Hideo Uchida, Masayoshi Umeno and Tetsuo Soga, "Iodine doping in amorphous carbon thin-films for optoelectronic devices," Physica B 376-377, pp. 316-319, 2006. https://doi.org/10.1016/j.physb.2005.12.081
  4. Aiping Liu, Huaping Wu, Jiaqi Zhu, Jiecai Han and Li Niu, "Evolution of compressive stress and electrical conductivity of tetrahedral amorphous carbon films with phosphorus incorporation," Diamond & Related Materials 17, pp. 1927-1932, 2008. https://doi.org/10.1016/j.diamond.2008.04.008
  5. Kazuhiko Endo and Toru Tatsumi, "Fluorinated amorphous carbon thin films grown by helicon plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics," Appl. Phys. Lett., vol. 68, no. 20, 13 May 1996.
  6. L. Valentini, V. Salerni, I. Armentano, J.M. Kenny, L. Lozzi and S. Santucci, "Effects of fluorine incorporation on the properties of amorphous carbon/p-type crystalline silicon heterojunction diodes," Journal of Non-Crystalline Solids 321, pp. 175-182, 2003. https://doi.org/10.1016/S0022-3093(03)00181-9
  7. R. Memming, "Properties of polymeric layers of amorphous hydrogenated carbon produced by a plasma-activated chemical vapour deposition process I:Spectroscopic Investigations," Thin Solid Films 143, pp. 279-289, 1986. https://doi.org/10.1016/0040-6090(86)90181-1
  8. G.Q. Yu, B.K. Tay, Z. Sun and L.K. Pan, "Properties of fluorinated amorphous diamond like carbon films by PECVD," Applied Surface Science 219, pp. 228-237, 2003. https://doi.org/10.1016/S0169-4332(03)00644-5
  9. Wim Soppe, Henk Rieffe and Arthur Weeber, "Bulk and Surface Passivation of Silicon Solar Cells Accomplished by Silicon Nitride Deposited on Industrial Scale by Microwave PECVD," Prog. Photovolt: Res. Appl. 2005; 13: pp. 551-569. https://doi.org/10.1002/pip.611
  10. Jayshree Seth and S.V. Badu, "Fluorohydrogenated amorphous carbon (a-C:H,F) films prepared by the r.f. plasma decomposition of 1,3-butadiene and carbon tetrafluoride," Thin Solid Films. 230, pp. 90-94, 1993. https://doi.org/10.1016/0040-6090(93)90497-D
  11. L. Valentini, V. Salerni, I. Armentano, J. M. Kenny, L. Lozzi and S. Santucci, "Effects of fluorine incorporation on the properties of amorphous carbon/p-type crystalline silicon heterojunction diodes," Journal of Non-Crystalline Solids 321, pp. 175-182, 2003. https://doi.org/10.1016/S0022-3093(03)00181-9
  12. Li QIANG, Bin ZHANG, Kaixiong GAO, Zhenbin GONG and Junyan ZHANG, "Hydrophobic, mechanical, and tribological properties of fluorine incorporated hydro-genated fullerene-like carbon films," Friction vol 1, no, 4, pp. 350-358, 2013. https://doi.org/10.1007/s40544-013-0031-1
  13. A. Bendavid, P. J. Martin, L. Randeniya and M. S. Amin, "The properties of fluorine con-taining diamond-like carbon films prepared by plasmaenhanced chemical vapour deposition," Diamond & Related Materials 18, pp. 66-71, 2009. https://doi.org/10.1016/j.diamond.2008.09.021
  14. N. K. Cuong, M. Tahara, N. Yamauchi and T. Sone, "Diamond-like carbon films deposited on polymers by plasma-enhanced chemical vapor deposition," Surface and Coatings Technology 174-175, pp. 1024-1028, 2003. https://doi.org/10.1016/S0257-8972(03)00360-8
  15. Chau-Chang Chou, Yi-Yang Wu, Jyh-Wei Lee, Chi-Hsiao Yeh and Jen-Ching Huang, "Characterization and haemocom-patibility of fluorinated DLC and Si interlayer on Ti6Al4V," Surface & Coatings Technology 231, pp. 418-422, 2013. https://doi.org/10.1016/j.surfcoat.2012.01.020
  16. W. Ding, D. A. Dikin, X. Chen, R. D. Piner, R. S. Ruoff, E. Zussman, X. Wang and X. Li, "Mechanics of hydrogenated amor-phous carbon deposits from electron-beam-induced deposition of a paraffin precursor," J. Appl. Phys. 98, pp. (014905)-(014905-7), 2005. https://doi.org/10.1063/1.1940138
  17. C. Jaoul, C. Dublanche-Tixier, O. Jarry, P. Tristant, J.P. Lavoute, L. Kilman, M. Colas, E. Laborde and H. Ageorges, "Tribological properties of hard a-C:H:F coatings," Surface & Coatings Technology 237, pp. 328-332, 2013. https://doi.org/10.1016/j.surfcoat.2013.07.042
  18. N.M. Santos, R.P. Mota, R.Y. Honda, M.A. Algatti, K.G. Kostov, M.E. Kayama, P.A.P. Nascente, N.C. Cruz and E.C. Rangel, "Mechanical and Tribological Properties of a-C:H:F Thin Films," J Supercond Nov Magn, 26, pp. 2525-2528, 2013. https://doi.org/10.1007/s10948-012-1729-4
  19. Hae-suk Jung and Hyung-ho Park, "Structural and electrical properties of co-sputtered fluorinated amorphous carbon film," Thin Solid Films 420-421, pp. 248-252, 2002. https://doi.org/10.1016/S0040-6090(02)00802-7
  20. G. Q. Yu, B. K Tay and Z. Sun, "Fluorinated amorphous diamond-like carbon films deposited by plasma-enhanced chemical vapor deposition," Surface & Coating Technology 191, pp. 236-241, 2005. https://doi.org/10.1016/j.surfcoat.2004.04.060
  21. D.T. CLARK and D. SHUTTLEWORTH, "Plasma Polymerization. II. An ESCA Investigation of Polymers Synthesized by Excitation of Inductively Coupled RF Plasma in Perfluorobenzene and Perfluorocyclohexane," Journal of Polymer Science : Polymer Chemistry Edition, vol. 18, pp. 27-46,1980.
  22. A. Dilks and E. Kay, "Plasma Polymerization of Ethylene and the Series of Fluoroethylenes: Plasma Effluent Mass Spectrometry and ESCA Studies," Macromolecules vol. 14, no. 3, pp. 855-862, 1981. https://doi.org/10.1021/ma50004a074