반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

물중탕을 이용한 대면적 SiNx EUV 펠리클 제작

Manufacturing Large-scale SiNx EUV Pellicle with Water Bath

  • 김정환 (한양대학교 신소재공학과) ;
  • 홍성철 (한양대학교 신소재공학과) ;
  • 조한구 (한양대학교 나노과학기술연구소) ;
  • 안진호 (한양대학교 신소재공학과)
  • Kim, Jung Hwan (Department of Materials Science and Engineering, Hanyang University) ;
  • Hong, Seongchul (Department of Materials Science and Engineering, Hanyang University) ;
  • Cho, Hanku (Institute of Nano Science and Technology, Hanyang University) ;
  • Ahn, Jinho (Department of Materials Science and Engineering, Hanyang University)
  • 투고 : 2016.02.16
  • 심사 : 2016.03.23
  • 발행 : 2016.03.31
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초록

EUV (Extreme Ultraviolet) pellicle which protects a mask from contamination became a critical issue for the application of EUV lithography to high-volume manufacturing. However, researches of EUV pellicle are still delayed due to no typical manufacturing methods for large-scale EUV pellicle. In this study, EUV pellicle membrane manufacturing method using not only KOH (potassium hydroxide) wet etching process but also a water bath was suggested for uniform etchant temperature distribution. KOH wet etching rates according to KOH solution concentration and solution temperature were confirmed and proper etch condition was selected. After KOH wet etching condition was set, $5cm{\times}5cm$ SiNx (silicon nitride) pellicle membrane with 80% EUV transmittance was successfully manufactured. Transmittance results showed the feasibility of wet etching method with water bath as a large-scale EUV pellicle manufacturing method.

키워드

참고문헌

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