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Manufacturing Large-scale SiNx EUV Pellicle with Water Bath  

Kim, Jung Hwan (Department of Materials Science and Engineering, Hanyang University)
Hong, Seongchul (Department of Materials Science and Engineering, Hanyang University)
Cho, Hanku (Institute of Nano Science and Technology, Hanyang University)
Ahn, Jinho (Department of Materials Science and Engineering, Hanyang University)
Publication Information
Journal of the Semiconductor & Display Technology / v.15, no.1, 2016 , pp. 17-21 More about this Journal
EUV (Extreme Ultraviolet) pellicle which protects a mask from contamination became a critical issue for the application of EUV lithography to high-volume manufacturing. However, researches of EUV pellicle are still delayed due to no typical manufacturing methods for large-scale EUV pellicle. In this study, EUV pellicle membrane manufacturing method using not only KOH (potassium hydroxide) wet etching process but also a water bath was suggested for uniform etchant temperature distribution. KOH wet etching rates according to KOH solution concentration and solution temperature were confirmed and proper etch condition was selected. After KOH wet etching condition was set, $5cm{\times}5cm$ SiNx (silicon nitride) pellicle membrane with 80% EUV transmittance was successfully manufactured. Transmittance results showed the feasibility of wet etching method with water bath as a large-scale EUV pellicle manufacturing method.
EUV lithography; EUV pellicle; manufacturing process; water bat;
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