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Design of a 512b Multi-Time Programmable Memory IPs for PMICs

PMIC용 512비트 MTP 메모리 IP설계

  • Received : 2016.02.12
  • Accepted : 2016.02.16
  • Published : 2016.02.29

Abstract

In this paper, a 512b MTP memory IP is designed by using MTP memory cells which are written by the FN (Fowler-Nordheim) tunneling method with only MV (medium voltage) devices of 5V which uses the back-gate bias, that is VNN (negative voltage). The used MTP cell consists of a CG (control gate) capacitor, a TG (tunnel gate) transistor, and a select transistor. To reduce the size of the MTP memory cell, just two PWs (P-wells) are used: one for the TG and the select transistors; and the other for the CG capacitor. In addition, just one DNW (deep N-well) is used for the entire 512b memory cell array. VPP and VNN generators supplying pumping voltages of ${\pm}8V$ which are insensitive to PVT variations since VPP and VNN level detectors are designed by a regulated voltage, V1V (=1V), provided by a BGR voltage generator.

본 논문에서는 back-gate bias 전압인 VNN (Negative Voltage)을 이용하여 5V의 MV (Medium Voltage) 소자만 이용하여 FN (Fowler-Nordheim) tunneling 방식으로 write하는 MTP cell을 사용하여 512비트 MTP IP를 설계하였다. 사용된 MTP cell은 CG(Control Gate) capacitor, TG(Tunnel Gate) transistor와 select transistor로 구성되어 있다. MTP cell size를 줄이기 위해 TG transistor와 select transistor를 위한 PW(P-Well)과 CG capacitor를 위한 PW 2개만 사용하였으며, DNW(Deep N-Well)은 512bit MTP cell array에 하나만 사용하였다. 512비트 MTP IP 설계에서는 BGR을 이용한 voltage regulator에 의해 regulation된 V1V (=1V)의 전압을 이용하여 VPP와 VNN level detector를 설계하므로 PVT variation에 둔감한 ${\pm}8V$의 pumping 전압을 공급할 수 있는 VPP와 VNN 발생회로를 제안하였다.

Keywords

References

  1. Analysis of the Status Quo in the Power Semiconductor, Electronics Information Center, July 2010.
  2. H. S. Chun, "Market Outlook and Domestic and Global Development Trend for Power Semiconductor," IITA Weekly Technology Trends, June 2009.
  3. H. Park, S. H. Lee, M. H. Park, P. B. Ha, Y. H. Kim, "Design of Small-Area Dual-Port eFuse OTP Memory IP for Power ICs," JKIIECT, vol. 8, no. 4, pp.310-318, Aug. 2015.
  4. Y. N. Yu, L. Y. Jin, K. I. Kim, M. S. Kim, Y. B. Park, M. H. Park, P. B. Ha, Y. H. Kim, "Design of 256 bit Single-Poly MTP Memory Based on BCD Process," J. Cent. South Univ. Technol., vol. 19, no. 12, pp. 3460-3467, Dec. 2012. https://doi.org/10.1007/s11771-012-1430-6
  5. J. H. Jang, H. Park, S. H. Lee, P. B. Ha, Y. H. Kim, " Design of MTP IP for PMIC'" ISSN 2005-0496, pp.143-146, June, 2015.
  6. F. Torricelli, L. Milani. L. Colalongo, A. Richelli, Kovacs-Vajna, Z.M., "Half-MOS Based Single-Poly EEPROM Cell With Program and Erase Bit Granularity," IEEE Electron Device Letters, vol. 34, no. 12, Dec. 2013.
  7. Roizin, Yakov, E. Pikhay, V. Dayan, A. Heiman, "High Density MTP Logic NVM for Power Management Applications", IEEE International Memory Workshop 2009, pp. 1-2, 2009.
  8. J. C. Lee J. C. Kim, S. H. Kim, "A Single Poly Flash Memory Intellectual Property for Low-Cost, Low-Density Embedded Nonvolatile Memory Applications," Journal of the Korean Physical Society, Vol.41, No.6, pp.846-850, Dec. 2002.
  9. J. Raszka, V. Tiwari, A. Mittal, M. Han, A. Shubat, "Embedded Flash Memory for Security Applications in a $0.13{\mu}m$ CMOS Logic Process," IEEE ISSCC Tech. Dig., pp. 46-47, Feb. 2004.
  10. Y. H. Kim, "Single Poly EEPROM Memory," KR. patent 10-1357847, Feb. 5, 2014.