참고문헌
- Nomura, K., Ohta, H., Takagi, A., Kamiya, T., Hirano, M., and Hosono, H., "Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors," Nature, Vol. 432, 488, 2004. https://doi.org/10.1038/nature03090
- Jo, J., Seo, O., Choi, H., and Lee, B., "Enhancement-mode ZnO thin-film transistor grown by metalorganic chemical vapor deposition," Applied Physics Express, Vol. 1, 041202, 2008. https://doi.org/10.1143/APEX.1.041202
-
Abe Y., Shinya K., Chiba Y., Kawamura M., and Sasaki K., "Time-dependent variation of the target mode in reactive sputtering of Al-
$O_2$ system," Vacuum, Vol. 84, 1365, 2010. https://doi.org/10.1016/j.vacuum.2009.12.021 - Li, S., Cai, Y., Han, D., Wang, Y., Sun, L., Chan, M., and Zhang, S., "Low-Temperature ZnO TFTs Fabricated by Reactive Sputtering of Metallic Zinc Target," IEEE Transactions on Electron Devices, Vol. 59, 2555, 2012. https://doi.org/10.1109/TED.2012.2205151
- Takayanagi, S., Yanagitani, T., and Matsukawa, M., "Effect of metal mode and oxide mode on unusual c-axis parallel oriented ZnO film growth on Al/glass substrate in a reactive magnetron sputtering of Zn target," Journal of Crystal Growth Vol. 363, 22, 2013. https://doi.org/10.1016/j.jcrysgro.2012.09.016
- Yoo, D., Kim, H., Kim, J., and Jo, J., "Current Variation in ZnO Thin-Film Transistor under Different Annealing Conditions," J. of the Semiconductor & Display Technology, Vol. 13, 63, 2014.
- Erhart, P., Klein, A., and Albe, K., "First-principles study on the structure and stability of oxygen related point defects in zinc oxide," Phys. Rev. B, Vol. 72, 085213, 2005. https://doi.org/10.1103/PhysRevB.72.085213