Transactions on Electrical and Electronic Materials

  • 제14권5호
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  • Pages.254-257
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  • 2013
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  • 1229-7607(pISSN)
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  • 2092-7592(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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PECVD Chamber Cleaning End Point Detection (EPD) Using Optical Emission Spectroscopy Data

  • Lee, Ho Jae (Department of Electronic Engineering, Myongji University) ;
  • Seo, Dongsun (Department of Electronic Engineering, Myongji University) ;
  • Hong, Sang Jeen (Department of Electronic Engineering, Myongji University) ;
  • May, Gary S. (School of Electrical and Computer Engineering, Georgia Institute of Technology)
  • 투고 : 2012.11.29
  • 심사 : 2013.08.07
  • 발행 : 2013.10.25
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초록

In-situ optical emission spectroscopy (OES) is employed for PECVD chamber monitoring. OES is used as an addon sensor to monitoring and cleaning end point detection (EPD). On monitoring plasma chemistry using OES, the process gas and by-product gas are simultaneously monitored. Principal component analysis (PCA) enhances the capability of end point detection using OES data. Through chamber cleaning monitoring using OES, cleaning time is reduced by 53%, in general. Therefore, the gas usage of fluorine is also reduced, so satisfying Green Fab challenge in semiconductor manufacturing.

키워드

참고문헌

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피인용 문헌

  1. Simulation and experimental verification of silicon dioxide deposition by PECVD vol.31, pp.06, 2017, https://doi.org/10.1142/S0217984917500555