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Fabrication of Tungsten Probe Tips for AFM using Electrochemical Etching

전기화학적 에칭법을 이용한 AFM용 텅스텐 탐침 제작에 관한 연구

  • Han, Gue-Bum (Dept. of Manufacturing System and Design Engineering, Seoul National University of Science & Technology) ;
  • Jang, Hyuna (Dept. of Manufacturing System and Design Engineering, Seoul National University of Science & Technology) ;
  • Ahn, Hyo-Sok (Dept. of Manufacturing System and Design Engineering, Seoul National University of Science & Technology)
  • 한규범 (서울과학기술대학교 기술경영융합대학 MSDE 전공) ;
  • 장현아 (서울과학기술대학교 기술경영융합대학 MSDE 전공) ;
  • 안효석 (서울과학기술대학교 기술경영융합대학 MSDE 전공)
  • Received : 2013.04.28
  • Accepted : 2013.06.01
  • Published : 2013.08.30

Abstract

As commercial atomic force microscopy (AFM) probes made of Si and $Si_3N_4$ have low stiffness, it is difficult to induce sufficient elastic deformation on the surface of a specimen in a tapping mode. Therefore, high-guality phase contrast images can not obtained. On the other hand, a tungsten AFM probe has relatively higher stiffness than a commercial AFM probe. Accordingly, it is expected to provide an enhanced phase contrast image, which is an effective tool for achieving a better understanding of the micromechanical properties of worn surfaces and wear mechanisms. In this study, on electrochemical etching method was optimized to fabricate tungsten probe tips for an AFM. Electrochemical etching was performed by applying pulse waves with a 20% duty cycle at various voltages instead of only a DC voltage, which has been commonly used.

Keywords

References

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Cited by

  1. Effective Control of Stiffness of Tungsten Probe for AFM by Electrochemical Etching vol.30, pp.4, 2014, https://doi.org/10.9725/kstle.2014.30.4.218