한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제46권3호
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  • Pages.133-138
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  • 2013
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
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유도결합 플라즈마 시스템의 수치 모델링에서 가스 분배 특성 해석

Characterization of Gas Distribution Effect in Inductively Coupled Plasma System

  • 주정훈 (군산대학교 공과대학 신소재공학과)
  • Joo, Junghoon (Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University)
  • 투고 : 2013.06.19
  • 심사 : 2013.06.29
  • 발행 : 2013.06.30
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초록

We have developed a 2D axi-symmetric numerical model for an inductively coupled plasma system in order to analyze gas mixing effect through a narrow gap shower head. For frictional flow, holes of 0.5 mm diameter and 2 mm length are approximately modeled in 2D. Gas velocity distribution 10 mm below the shower head showed 2 times difference between the center and the edge at 10 mTorr. At 10 mm above the wafer, it was increased to 6 times difference due to the pumping duct effect. The model with a 5 mm height buffer region of a shower head showed reasonable behavior of Ar discharge. The density of Ar metastable showed additional peak inside the buffer region around the edge holes.

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참고문헌

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피인용 문헌

  1. Efficiency Enhancement of PIC-MCC Modeling for Magnetron Sputtering Simulations Using GPU Parallelization vol.44, pp.9, 2016, https://doi.org/10.1109/TPS.2016.2593491