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http://dx.doi.org/10.5695/JKISE.2013.46.3.133

Characterization of Gas Distribution Effect in Inductively Coupled Plasma System  

Joo, Junghoon (Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University)
Publication Information
Journal of the Korean institute of surface engineering / v.46, no.3, 2013 , pp. 133-138 More about this Journal
Abstract
We have developed a 2D axi-symmetric numerical model for an inductively coupled plasma system in order to analyze gas mixing effect through a narrow gap shower head. For frictional flow, holes of 0.5 mm diameter and 2 mm length are approximately modeled in 2D. Gas velocity distribution 10 mm below the shower head showed 2 times difference between the center and the edge at 10 mTorr. At 10 mm above the wafer, it was increased to 6 times difference due to the pumping duct effect. The model with a 5 mm height buffer region of a shower head showed reasonable behavior of Ar discharge. The density of Ar metastable showed additional peak inside the buffer region around the edge holes.
Keywords
Numerical modeling; Inductively coupled plasma; CFD-ACE;
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Times Cited By KSCI : 2  (Citation Analysis)
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