Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Enhanced Hydrophilic Property of TiO2 Thin Film Deposited on Glass Etched with O2 Plasma

  • Kim, Hwa-Min (Department of Advanced Energy Material Science & Engineering, Catholic University of Daegu) ;
  • Seo, Sung Bo (Department of Electronics Engineering, Catholic University of Daegu) ;
  • Kim, Dong Young (Department of Electronics Engineering, Catholic University of Daegu) ;
  • Bae, Kang (Department of Electronics Engineering, Catholic University of Daegu) ;
  • Sohn, Sun Young (Department of Electronics Engineering, Catholic University of Daegu)
  • Received : 2013.03.22
  • Accepted : 2013.04.15
  • Published : 2013.06.25
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Abstract

$TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.

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References

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