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Measuring Methods for Two-dimensional Position Referring to the Target Pattern

참조패턴 기반의 2차원 변위 측정 방법론

  • 정광석 (한국교통대학교 기계공학과) ;
  • 이상헌 (안동대학교 기계설계공학과) ;
  • 박성준 (한국교통대 기계공학과)
  • Received : 2013.01.14
  • Accepted : 2013.01.30
  • Published : 2013.02.15

Abstract

In this paper, we review two-dimensional measuring methods referring to target patterns. The patterns consist of two linearly-repeated patterns or is designed repeatedly in two-dimension. The repeated properties are reflectivity, refractivity, air-gapping distance, capacitance, magnetic reluctance, electrical resistance and sloping gradient, etc. However, the optical methods are generally used for high speed processing and density, and their encoding principles are treated here. In case of two-dimensional pattern, as there is not inherently error between single units encoding the pattern except for the metrology frame errors, the end-effector position of an object accompanying the pattern can be measured with respect of the global frame without via error. Therefore, it is regarded as a substitute for laser interferometer with severe environmental constraints and has been applied to the high-accurate planar actuator.

Keywords

References

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