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http://dx.doi.org/10.7735/ksmte.2013.22.1.77

Measuring Methods for Two-dimensional Position Referring to the Target Pattern  

Jung, Kwang Suk (한국교통대학교 기계공학과)
Lee, Sang Heon (안동대학교 기계설계공학과)
Park, Sung-Jun (한국교통대 기계공학과)
Publication Information
Journal of the Korean Society of Manufacturing Technology Engineers / v.22, no.1, 2013 , pp. 77-84 More about this Journal
Abstract
In this paper, we review two-dimensional measuring methods referring to target patterns. The patterns consist of two linearly-repeated patterns or is designed repeatedly in two-dimension. The repeated properties are reflectivity, refractivity, air-gapping distance, capacitance, magnetic reluctance, electrical resistance and sloping gradient, etc. However, the optical methods are generally used for high speed processing and density, and their encoding principles are treated here. In case of two-dimensional pattern, as there is not inherently error between single units encoding the pattern except for the metrology frame errors, the end-effector position of an object accompanying the pattern can be measured with respect of the global frame without via error. Therefore, it is regarded as a substitute for laser interferometer with severe environmental constraints and has been applied to the high-accurate planar actuator.
Keywords
Binary grid pattern image; Halbach magnet array; Half-shaded square pattern; Sawyer motor; Superposed pattern; Surface encoder;
Citations & Related Records
Times Cited By KSCI : 6  (Citation Analysis)
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