References
- J. R. Davis, Corrosion of Aluminum and Aluminum Alloys, 1st ed., ASM international, United States of America (1999).
- Y. S. Tak, J. W. Kang and J. S. Choi, J. Korean. Ind. Eng. Chem., 17,335 (2006).
- W. C. Mosheir, G. D. Davis and K. Ahera, Corros. Sci., 27, 785 (1987). https://doi.org/10.1016/0010-938X(87)90037-0
- M. S. Hunter and P. Fowle, J. Electrochem. Soc., 103, 482 (1956). https://doi.org/10.1149/1.2430389
- S. Y. Lee, D. H. Park, J. P. Won, Y. H. Kim, M. H. Lee, K. M. Moon and J. H. Jeong, Corro. Sci. Tech., 11, 280 (2012) https://doi.org/10.14773/cst.2012.11.6.280
- K. Shimizu, G. M. Brown, H. Habazaki, K. Kobayashi, P. Skeldon, G. E. Thompson and G. C. Wood, Electrochimica Acta, 44, 2297 (1999). https://doi.org/10.1016/S0013-4686(98)00355-7
- J. W. Diggle, T. C. Downie and C. W. Goulding, Chem. Rev., 69, 365 (1969). https://doi.org/10.1021/cr60259a005
- R. L. Chiu, P. H. Chang and C. H. Tung, Thin Solid Films, 260, 47 (1995). https://doi.org/10.1016/0040-6090(94)06491-1
- N. F. Jackson and D. S. Campbell, Thin Solid Films, 36, 331 (1976). https://doi.org/10.1016/0040-6090(76)90027-4
- R. L. Chiu and P. H. Chang, J. Electrochem. Soc., 142, 525 (1995). https://doi.org/10.1149/1.2044093
- L. Bazzi. R. Salghi, Z. Ei Alami, E. Ait Addi, S. EI Issami, S. Kertit and B. Hammouti, Prog. Org. Coat., 51, 113 (2004). https://doi.org/10.1016/j.porgcoat.2004.06.004
- W. T. Tsai, Y. H. Hon and J. T. Lee, Surf. Coat. Technol., 31, 365 (1987). https://doi.org/10.1016/0257-8972(87)90163-0
- K. Wefers and C. Misra, Proceedings of the 1st Oxides and Hydroxides of Aluminum, Alcoa Laboratories (1987).
- P. R. Underhill and A. N. Rider, Surf. Coatings Tech., 192, 199 (2005). https://doi.org/10.1016/j.surfcoat.2004.10.011
- R. S. Alwitt, J. Electrochem. Soc., 121, 1322 (1974). https://doi.org/10.1149/1.2401679
- Izaya Nagata, Aluminum Electrolytic Capacitor, Japan Capacitor Company, p.278, Japan (1983).
- B. Cheng, S. Ramamurthy and N. S. Mclntyre, J. Mater. Eng. Perform., 6, 405 (1997). https://doi.org/10.1007/s11665-997-0108-y
- J. K. Chang, C. M. Liao, C. H. Chen and W. T. Tsai, J. Power Sources, 138, 301 (2004). https://doi.org/10.1016/j.jpowsour.2004.06.021
- Japanese Society of Light Metal, Texture and Properties of Aluminum, p.137, Japan (1991).
- H. Konno, S. Kobayashi, H. Takahashi and M. Nagayama, Corros. Sci., 22, 913 (1982). https://doi.org/10.1016/0010-938X(82)90061-0
- J. Zahr, S. Oswald, M. Turpe, H. J. Ullrich and U. Fussel, Vacuum, 86, 1216 (2012). https://doi.org/10.1016/j.vacuum.2011.04.004
- Y. I. Seo, Y. J. Lee, D. G. Kim, K. H. Lee and Y. D. Kim, Appl. Surf. Sci., 256, 4434 (2010). https://doi.org/10.1016/j.apsusc.2010.01.011
- S. Geng, S. Zhang and H. Onishi, Mater. Tech. (2002).
- J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, 1st ed., Physical Electronics, USA (1995).
- S. Yamamoto, H. Bluhm, K. Andersson, G. Ketteler, H. Ogasawara, M. Salmeron and A. Nilsson, J. Phys.: Condens. Matter, 20, 184025 (2008). https://doi.org/10.1088/0953-8984/20/18/184025
- B. C. Bunker, G. C. Nelson, K. R. Zavadil, J. C. Barbour, F. D. Wall and J. P. Sullivan, J. Phys. Chem. B, 106, 4705 (2002). https://doi.org/10.1021/jp013246e
- W. J. Bernard and J. J. Randall Jr., J. Electrochem. Soc., 108, 822 (1961). https://doi.org/10.1149/1.2428230
- X. Yang, Z. Sun, D. Wang and W. Forsling, J. Colloid Interface Sci., 308, 395 (2007). https://doi.org/10.1016/j.jcis.2006.12.023