Abstract
Novel platform technology has been developed to replace the photolithography used currently for manufacturing semiconductors and display devices. As a substrate, plastics, especially polycarbonates, have been considered for future application such as flexible display. Other plastics, i.e. polyimide, polyetheretherketon, and polyethersulfone developed for the substrate at this moment, are available for photolithography due to their high glass transition temperature, instead of high price. After thin polystyrene film was coated on the polycarbonate substrate, microstructure of the film was formed with polydimethylsiloxane template over the glass transition temperature of the polystyrene. The surface of the structure was treated with potassium permanganate and octadecyltrimethoxysilane so that the surface became hydrophobic. After this surface treatment, the nanoparticles dispersed in aqueous solution were aligned in the structure followed by evaporation of the DI water. Without the treatment, the nanoparticles were placed on the undesired region of the structure. Therefore, the interfacial interaction was also utilized for the nanoparticle alignment. The surface was analyzed using X-ray photoelectron spectrometer. The evaporation of the solvent occurred after several drops of the solution where the hydrophilic nanoparticles were dispersed. During the evaporation, the alignment was precisely guided by the physical structure and the interfacial interaction. The alignment was applied to the electric device.
화면표시장치 제조에 널리 이용되고 있는 미세구조 제조향 노광공정을 대신할 기반기술을 개발하고자 한다. 저가의 Polycarbonate 기판에 미세구조를 제조하기 위하여, Spin Coating으로 Polystyrene 박막을 형성하고 박막 위에 Polydimethylsiloxane 주형으로 소프트석판술을 적용하였다. 제조된 구조에 나노입자들을 배열하기 위해 계면작용을 이용하고자 하므로, 구조의 표면을 화학반응에 의해 소수성으로 개질하였다. 소수성으로의 개질은 Polystyrene 표면을 과망간칼륨으로 처리하고 Aminopropyltriethoxysilane을 반응시켜서 수행되었다. 개질된 특성은 X선광전자분광기로 분석되었다. 개질된 표면에서 친수성나노입자들이 분산되어 있는 수용액을 마이크로리터 단위의 방울로 떨어뜨리고, 수용액을 증발시킨다. 증발과정에서 계면상호작용과 미세구조의 물리적 유도로 특정 영역에 나노입자들이 배열되었다. 그리고, 이 배열의 전기적 응용을 확인하였다.
