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http://dx.doi.org/10.9713/kcer.2012.50.5.929

Soft-lithography for Manufacturing Microfabricated-Circuit Structure on Plastic Substrate  

Park, Min-Jung (Department of Chemical & Biomolecular Engineering, College of Energy and Biotechnology, Seoul National University of Science and Technology)
Ju, Heong-Kyu (Department of Physics, College of Natural Science, Gachon University)
Park, Jin-Won (Department of Chemical & Biomolecular Engineering, College of Energy and Biotechnology, Seoul National University of Science and Technology)
Publication Information
Korean Chemical Engineering Research / v.50, no.5, 2012 , pp. 929-932 More about this Journal
Abstract
Novel platform technology has been developed to replace the photolithography used currently for manufacturing semiconductors and display devices. As a substrate, plastics, especially polycarbonates, have been considered for future application such as flexible display. Other plastics, i.e. polyimide, polyetheretherketon, and polyethersulfone developed for the substrate at this moment, are available for photolithography due to their high glass transition temperature, instead of high price. After thin polystyrene film was coated on the polycarbonate substrate, microstructure of the film was formed with polydimethylsiloxane template over the glass transition temperature of the polystyrene. The surface of the structure was treated with potassium permanganate and octadecyltrimethoxysilane so that the surface became hydrophobic. After this surface treatment, the nanoparticles dispersed in aqueous solution were aligned in the structure followed by evaporation of the DI water. Without the treatment, the nanoparticles were placed on the undesired region of the structure. Therefore, the interfacial interaction was also utilized for the nanoparticle alignment. The surface was analyzed using X-ray photoelectron spectrometer. The evaporation of the solvent occurred after several drops of the solution where the hydrophilic nanoparticles were dispersed. During the evaporation, the alignment was precisely guided by the physical structure and the interfacial interaction. The alignment was applied to the electric device.
Keywords
Polycarbonate Substrate; Polystyrene Film; Polydimethylsiloxane Template; Interfacial Interaction; Nanoparticle Alignment;
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Times Cited By KSCI : 1  (Citation Analysis)
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1 Meinhart, C. D. and Zhang, H. J., "The Flow Structure Inside a Microfabricated Inkjet Printhead," J. Microelectromech. Syst., 9(1), 67-75(2000).   DOI   ScienceOn
2 Shereshefsky, J. L. and Steckler, S., "A Study of the Evaporation of Small Drops and of the Relationship Between Surface Tension and Curvature," J. Chem. Phys., 4, 108-115(1936).   DOI
3 Carvert, P., "Inkjet Printing for Materials and Devices," Chem. Mater., 13(10), 3299-3305(2001).   DOI   ScienceOn
4 Sirringhaus, H., Kawase, T., Friend, R. H., Shimoda, T., Inbasekaran, M., Wu, W. and Woo, E. P., "High-Resolution Inkjet Printing of All-Polymer Transistor Circuits," Science, 290(5499), 2123-2126(2000).   DOI   ScienceOn
5 Lee, G. U., Metzger, S., Natesan, M., Yanavich, C. and Dufrêne, Y. F., "Imprementation of Force Differentiation in the Immunoassay," Anal. Biochem. 287, 261-271(2000).   DOI   ScienceOn
6 Park, J.-W. and Lee, G. U., "Properties of Mixed Lipid Mono-layers Assembled on Hydrophobic Surfaces through Vesicles," Langmuir, 22, 5057-5063(2006).   DOI   ScienceOn
7 Lee, S. W., Shang, H., Haasch, R. T., Petrova, V. and Lee, G. U, "Transport and Functional Behaviour of Poly(ethylene glycol)- Modified Nanoporous Alumina Membranes," Nanotechnology, 16, 1335-1340(2005).   DOI   ScienceOn
8 Israelachivili, J. N., Intermolecular & Surface Forces, Academic Press, New York, 183-192(1991).
9 Park, J.-W., "Surface Properties of Glutathione Layer Formed on Gold Surfaces," Korean Chem. Eng. Res. (HWAHAK KONGHAK), 50(2), 379-384(2012).   DOI   ScienceOn
10 Madou, M., Fundamentals of Microfabrication, CRC Press, New York, 2-86(1997).
11 Huang, D. and Kim, E. S., "Micromachined Acoustic-wave Liquid Ejector," J. Microelectromech. Syst., 10, 442-449(2001).   DOI   ScienceOn
12 Tseng, F. G., Kim, C. J. and Ho, C. M., "A High-resolution High-frequency Monolithic Top-shooting Microinjector Free of Satellite Drops - Part I: Concept, Design, and Model," J. Microelectromech. Syst., 11(5), 427-436(2002).   DOI   ScienceOn
13 Tseng, F. G., Kim, C. J. and Ho, C. M., "A High-resolution High-frequency Monolithic Top-shooting Microinjector Free of Satellite Drops - Part II: Fabrication, Implementation, and Characterization," J. Microelectromech. Syst., 11(5), 437-447(2002).   DOI   ScienceOn