마이크로전자및패키징학회지 (Journal of the Microelectronics and Packaging Society)

  • 제19권4호
  • /
  • Pages.33-37
  • /
  • 2012
  • /
  • 1226-9360(pISSN)
  • /
  • 2287-7525(eISSN)
한국마이크로전자및패키징학회 (The Korean Microelectronics and Packaging Society)
권호 표지
DOI QR코드

DOI QR Code

Analytical Quantification and Effect of Microstructure Development in Thick Film Resistor Processing

  • Lee, Byung Soo (Division of Advanced Materials Engineering, Chonbuk National University)
  • 투고 : 2012.10.30
  • 심사 : 2012.12.12
  • 발행 : 2012.12.30
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

Microstructure developments of $RuO_2$ based thick film resistors during firing as a function of glass viscosity were analytically quantified and its effect on the electrical property was investigated. The microstructure development was retarded as the viscosity of glass was increased. It was found that the viscosity range for each stage of microstructure development are as follows ; $7500-10^5Pa{\cdot}s$ for the glass sintering, $2000-7500Pa{\cdot}s$ for the glass island formation, $700-2000Pa{\cdot}s$ for the glass spreading, and $50-700Pa{\cdot}s$ for the infiltration. The sheet resistivity decreased as the viscosity of glass in the resistor film increased due to the higher chance of sintering for the conductive particles with the higher viscosity of the glass.

키워드

참고문헌

  1. R. W. Vest, "Conduction Mechanisms in Thick Film Microcircuits", Final Technical Report, ARPA order No. 1642 (1975).
  2. A. N. Prabhu and R. W. Vest, "Investigation of Microstructure Development in RuO2-Lead Borosilicate Glass Thick Films", Mat. Sci. Res., 10, 399 (1975). https://doi.org/10.1007/BF00543683
  3. G. E. Pike and C. H. Seager, "Electrical Properties and Conduction Mechanisms on Ru based Thick Film (Cermet) Resistors", J. Appl. Phys., 48(12), 5152 (1977). https://doi.org/10.1063/1.323595
  4. P. Palanisamy, "Influences of Substrate on Microstructure Development in Thick Film Resistors", in Ph.D. Thesis, Purdue University, Indiana (1979).
  5. D. H. R. Sarma, "Microstructure Development Process in Ruthenium Dioxide Glass Thick Film Resistors", in Ph.D. Thesis, Purdue University, Indiana (1982).
  6. S. M. Chitale and R. W. Vest, "Critical Relationships between Particle Size, Composition, and Microstructure in Thick-Film Resistors", IEEE Trans. Comp. Hybrids, Manuf. Technol., 11(4), 604 (1988). https://doi.org/10.1109/33.16704
  7. P. Palanisamy, D. H. R. Sarma and R. W. Vest, "Liquid-Phase Sintering in Thick Film Resistor Processing", J. Am. Ceram. Soc., 68(8), C215 (1985).
  8. A. Kusy, "On the Structure and Conduction Mechanism of Thick Resistive Films", Thin Solid Films, 37, 281 (1976). https://doi.org/10.1016/0040-6090(76)90599-X
  9. A. Kusy, "Chains of Conducting Particles that Determine the Resistivity of Thick Resistive Films", Thin Solid Films, 43, 243 (1977). https://doi.org/10.1016/0040-6090(77)90285-1
  10. T. Shartis and S. Spinner, "Viscosity and Density of Molten Optical Glasses", J. Res. NBS., 46(3), 176 (1951).
  11. G. S. Fulcher, "Analysis of Recent Measurements of the Viscosity of Glasses", J. Am. Ceram. Soc., 8(6), 339 (1925). https://doi.org/10.1111/j.1151-2916.1925.tb16731.x