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Electrical Characterization of Electronic Materials Using FIB-assisted Nanomanipulators

  • Roh, Jae-Hong (Nano-analysis Center, Korea Institute of Science & Engineering) ;
  • You, Yil-Hwan (Department of Materials Science & Engineering, Hongik University) ;
  • Ahn, Jae-Pyeong (Nano-analysis Center, Korea Institute of Science & Engineering) ;
  • Hwang, Jinha (Department of Materials Science & Engineering, Hongik University)
  • Received : 2012.12.04
  • Accepted : 2012.12.06
  • Published : 2012.12.31

Abstract

Focused Ion Beam (FIB) systems have incorporated versatile nanomanipulators with inherent sophisticated machining capability to characterize the electrical properties of highly miniature components of electronic devices. Carbon fibers were chosen as a model system to test the applicability of nanomanipulators to microscale electronic materials, with special emphasis on the direct current current-voltage characterizations in terms of electrode configuration. The presence of contact resistance affects the electrical characterization. This resistance originates from either i) the so-called "spreading resistance" due to the geometrical constriction near the electrode - material interface or ii) resistive surface layers. An appropriate electrode strategy is proposed herein for the use of FIB-based manipulators.

Keywords

References

  1. Giannuzzi L A, Drown J L, Brown S R, Irwin R B, and Stevie F A (1998) Applications of the FIB lift-out technique for TEM specimen preparation. Microsc. Res. Tech. 41, 285-290. https://doi.org/10.1002/(SICI)1097-0029(19980515)41:4<285::AID-JEMT1>3.0.CO;2-Q
  2. Hwang J H, Kirkpatrick K S, Mason T O, and Garboczi E J (1997) Experimental limitations in impedance spectroscopy: Part IV. Electrode contact effects. Solid State Ionics 98, 93-104. https://doi.org/10.1016/S0167-2738(97)00075-1
  3. Jeon J, Floresca H C, and Kim M J (2010) Fabrication of complex three-dimensional nanostructures using focused ion beam and nanomanipulation. J. Vac. Sci. Technol. B 28, 549-553. https://doi.org/10.1116/1.3406134
  4. Lasagni F, Lasagni A, Engstler M, Degischer H P, and Mucklich F (2008) Nano-characterization of cast structures by FIB-tomography. Adv. Eng. Mater. 10, 62-66. https://doi.org/10.1002/adem.200700249
  5. Nam C Y, Kim J Y, and Fischer J E (2005) Focused-ion-beam platinum nanopatterning for GaN nanowires: ohmic contacts and patterned growth. Appl. Phys. Lett. 86, 193112. https://doi.org/10.1063/1.1925775
  6. Newman J (1966) Current distribution on a rotating disk below the limiting current. J. Electrochem. Soc. 113, 1235-1241. https://doi.org/10.1149/1.2423795
  7. Nikawa K (1991) Applications of focused ion beam technique to failure analysis of very large scale integrations: a review. J. Vac. Sci. Technol. B 9, 2566-2577.
  8. Tseng A A (2005) Recent developments in nanofabrication using focused ion beams. Small 1, 924-939. https://doi.org/10.1002/smll.200500113