Investigation of Laser Scattering Pattern and Defect Detection Based on Rayleigh Criterion for Crystalline Silicon Wafer Used in Solar Cell

태양전지 실리콘 웨이퍼에서의 레일리기준 기반 레이저산란 패턴 분석 및 결함 검출

  • Yean, Jeong-Seung (Graduate School, Aeronautical & Mechanical Design Eng., Chungju National Univ.) ;
  • Kim, Gyung-Bum (Aeronautical & Mechanical Design Eng., Chungju National Univ.)
  • 연정승 (충주대학교 항공기계설계학과 대학원) ;
  • 김경범 (충주대학교 항공기계설계학과)
  • Received : 2010.09.02
  • Accepted : 2011.02.07
  • Published : 2011.05.01

Abstract

In this paper, patterns of laser scattering and detection of micro defects have been investigated based on Rayleigh criterion for silicon wafer in solar cell. Also, a new laser scattering mechanism is designed using characteristics of light scattering against silicon wafer surfaces. Its parameters are to be optimally selected to obtain effective and featured patterns of laser scattering. The optimal parametric ranges of laser scattering are determined using the mean intensity of laser scattering. Scattering patterns of micro defects are investigated at the extracted parameter region. Among a lot of pattern features, both maximum connected area and number of connected component in patterns of laser scattering are regarded as the important information for detecting micro defects. Their usefulness is verified in the experiment.

Keywords

References

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