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Investigation of Laser Scattering Pattern and Defect Detection Based on Rayleigh Criterion for Crystalline Silicon Wafer Used in Solar Cell  

Yean, Jeong-Seung (Graduate School, Aeronautical & Mechanical Design Eng., Chungju National Univ.)
Kim, Gyung-Bum (Aeronautical & Mechanical Design Eng., Chungju National Univ.)
Publication Information
Journal of the Korean Society for Precision Engineering / v.28, no.5, 2011 , pp. 606-613 More about this Journal
Abstract
In this paper, patterns of laser scattering and detection of micro defects have been investigated based on Rayleigh criterion for silicon wafer in solar cell. Also, a new laser scattering mechanism is designed using characteristics of light scattering against silicon wafer surfaces. Its parameters are to be optimally selected to obtain effective and featured patterns of laser scattering. The optimal parametric ranges of laser scattering are determined using the mean intensity of laser scattering. Scattering patterns of micro defects are investigated at the extracted parameter region. Among a lot of pattern features, both maximum connected area and number of connected component in patterns of laser scattering are regarded as the important information for detecting micro defects. Their usefulness is verified in the experiment.
Keywords
Defect Detection; Laser Scattering; Maximum Connected Area; Rayleigh Criterion; Silicon Wafer; Solar Cell;
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Times Cited By KSCI : 2  (Citation Analysis)
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