Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Molecular Dynamics Simulations Study on Surface Polishing by Spherical Abrasive

구형 연마재에 의한 표면 연마에 관한 분자동역학 시뮬레이션 연구

  • Park, Byung-Heung (Department of Chemical and Biological Engineering, Chungju National University) ;
  • Kang, Jeong-Won (Department of Computer Engineering, Chungju National University)
  • 박병흥 (충주대학교 화공생물공학과) ;
  • 강정원 (충주대학교 컴퓨터공학과)
  • Received : 2011.11.08
  • Accepted : 2011.12.15
  • Published : 2011.12.31
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Abstract

We investigated the substrate surface polishing by the spherical rigid abrasive under the compression using classical molecular dynamics modeling. We performed three-dimensional molecular dynamic simulations using the Morse potential functions for the various slide-to-roll ratios, from 0 to 1, and then, the compressive forces acting on the spherical rigid abrasive were calculated as functions of the time and the slide-to-roll ratio. The friction coefficients obtained from the classical molecular dynamics simulations were compared to those obtained from the experiments; and found that the molecular dynamic simulation results with the slide-to-roll ratio of 0 value were in good agreement with the experimental results.

Keywords

References

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