Journal of the Institute of Electronics Engineers of Korea SD (대한전자공학회논문지SD)

The Institute of Electronics and Information Engineers (대한전자공학회)
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Extraction and Modeling of High-Temperature Dependent Capacitance-Voltage Curve for RF MOSFETs

고온 종속 RF MOSFET 캐패시턴스-전압 곡선 추출 및 모델링

  • Ko, Bong-Hyuk (Department of Electronics Engineering, Hankuk University of Foreign Studies) ;
  • Lee, Seong-Hearn (Department of Electronics Engineering, Hankuk University of Foreign Studies)
  • 고봉혁 (한국외국어대학교 전자공학과) ;
  • 이성현 (한국외국어대학교 전자공학과)
  • Received : 2010.07.20
  • Accepted : 2010.09.16
  • Published : 2010.10.25
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Abstract

In this paper, RF Capacitance-Voltage(C-V) curve of short-channel MOSFET has been extracted from the room temperature to $225^{\circ}C$ using a RF method based on measured S-parameter data, and its high-temperature dependent characteristics are empirically modeled. It is observed that the voltage shift according to the variation of temperature in the weak inversion region of RF C-V curves is lower than the threshold voltage shift, but it is confirmed that this phenomenon is unexplainable with a long-channel theoretical C-V equation. The new empirical equation is developed for high-temperature dependent modeling of short-channel MOSFET C-V curves. The accuracy of this equation is demonstrated by observing good agreements between the modeled and measured C-V data in the wide range of temperature. It is also confirmed that the channel capacitance decreases with increasing temperature at high gate voltage.

본 연구에서는 S-파라미터 측정 데이터를 사용하는 RF측정방법으로 short-channel MOSFET의 RF 캐패시턴스 전압(C-V) 곡선을 상온에서 $225^{\circ}C$까지 추출하였으며, 추출된 고온 종속 특성을 엠피리컬하게 모델링하였다. RF C-V 특성곡선의 weak inversion영역에서 온도 변화에 따른 voltage shift가 threshold voltage shift보다 적은 현상이 관찰되었지만, 기존 long-channel C-V 이론 방정식으로 설명할 수 없는 현상임이 입증되었다. 이러한 short-channel C-V 곡선의 고온 종속 모델링을 위해서 새로운 엠피리컬 방정식이 개발되었다. 이 방정식의 정확도는 모델된 C-V곡선과 측정 데이터가 넓은 온도범위에서 잘 일치하는 결과를 관찰함으로써 입증되었다. 또한, 높은 게이트 전압에서는 온도가 증가함에 따라 채널 캐패시턴스 값이 감소하는 것을 확인할 수 있다.

Keywords

References

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