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CU+ ION EXTRACTION FROM A MODIFIED BERNAS ION SOURCE IN A METAL-ION IMPLANTER

  • Hong, In-Seok (Proton Engineering Frontier Project, Korea Atomic Energy Research Institute Nuclear physics, Fusion, and Laser technology) ;
  • Lee, Hwa-Ryun (Proton Engineering Frontier Project, Korea Atomic Energy Research Institute Nuclear physics, Fusion, and Laser technology) ;
  • Trinh, Tu Anh (Proton Engineering Frontier Project, Korea Atomic Energy Research Institute Nuclear physics, Fusion, and Laser technology) ;
  • Cho, Yong-Sub (Proton Engineering Frontier Project, Korea Atomic Energy Research Institute Nuclear physics, Fusion, and Laser technology)
  • Published : 2009.06.30

Abstract

An ion implanter, which can serve as a metal-ion supply, has been constructed and performance tested. Copper ions are generated and extracted from a Bernas ion source with a heating crucible that provides feed gases to sustain the plasma. Sable arc plasmas can be sustained in the ion source for a crucible temperature in excess of $350^{\circ}C$. Stable extraction of the ions is possible for arc Currents less than 0.3 A. Arc currents increase with the induced power of a block cathode and the transverse field in the ion source. $Cu^+$ ions in the extracted beam are separated using a dipole magnet. A $20{\mu}A$ $Cu^+$ ion current can be extracted with a 0.2 A arc current. The ion current can support a dose of $10^{16}ions/cm^2$ over an area of $15\;cm^2$ within a few hours.

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References

  1. P.D. Townsend, R. Brooks, D.E. Hole, Z. Wu, A. Turkler, N. Can, A. Suarez-Garcia, J. Gonzalo, “Luminescence from copper nanoparticles”, Appl. Phys., B 73, 345(2001) https://doi.org/10.1007/s003400100636
  2. G. De, M. Gusso, L. Tapfer, M. Catalano, F. Gonella, G. Mattei, P. Mazzoldi, G. Battaglin, “Annealing behavior of silver, copper, and silver-copper nanoclusters in a silica matrix synthesized by the sol-gel technique”, J. Appl. Phys. 80 (12), 6734 (1996) https://doi.org/10.1063/1.363800
  3. Y.Z Wan, G.Y. Xiong, “Modification of medical metals by ion implantation of copper”, Applied Surface Science, 253, 9426 (2007) https://doi.org/10.1016/j.apsusc.2007.06.031
  4. T. V. Kulevoy, R. P. Kuibeda, S. V. Petrenko, V. A. Batalin, “ITEP Bernas ion source with additional electron beam”, Review of Scientific instruments 77, 03C110 (2006) https://doi.org/10.1063/1.2165267
  5. Thomas N. Horsky, “Indirectly heated cathode arc discharge source for ion implantation of semiconductors”, Review of Scientific instruments, 69, 1688(1998) https://doi.org/10.1063/1.1148866
  6. Ian G. Brown, The physics and technology of ion source, 2ed, p 138 (2004), WILEY-VCH Verlag GmbH & Co, Weinheim