Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method

플라즈마 CVD 법을 이용한 대면적 균일한 비정질 탄소 막 증착

  • 윤상민 (전북대학교 전기공학과) ;
  • 양성채 (전북대학교 전기공학과)
  • Published : 2009.05.01
Download PDF
⟨ Previous Next ⟩

Abstract

It has been investigated for the film uniformity and deposition rate of a-C:H films on glass substrate and polymeric materials in the presence of the modulated crossed magnetic field. We used Plasma CVD, i.e, using a crossed electromagnetic field, for uniform depositing thin film. The optimum discharge condition has been discussed for the gas pressure, the magnetic flux density and the distance between substrate and electrodes, As a result, it is found that the optimum discharge conditions are $CH_4$ concentration $CH_4$=10 %, modulated magnetic flux density B=48 Gauss, pressure P=100 mTorr, discharge power supply voltage V=l kV under these experimental conditions. By using these experimental condition, it is possible to prepare the most uniform film extends over about 160 mm of the film width. In this study, we deposited a-C:H thin film on glass substrate, and have a plan that using this condition, study depositing a-C:H thin film on polymeric substrate in next studies.

Keywords

References

  1. S. Meskinis, R. Gudaitis, V. Kopustinskas, and S. Tamulevicius, 'Electrical and piezoresistive properties of ion beam deposited DLC films', Applied Surface Science, Vol. 254, Issues 16, 15, p. 5252, 2008 https://doi.org/10.1016/j.apsusc.2008.02.037
  2. 최원석, 박문기, 홍병유, 'PECVD로 합성한 다이아몬드상 카본박막의 전기적 특성', 전기전자재료학회논문지, 21권, 11호, p. 973, 2008 https://doi.org/10.4313/JKEM.2008.21.11.973
  3. D. Caschera, F. Federici, S. Kaciulis, L. Pandolfi, A. Cusmà, and G. Padeletti, 'Deposition of Ti-containing diamond-like carbon (DLC) films by PECVD technique', Materials Science and Engineering, Vol. 27, Issues 5-8, p. 1328, 2007 https://doi.org/10.1016/j.msec.2006.06.027
  4. G. Reisel and A. Dorner-Reisel, 'Hydrogen containing DLC coatings on UHMW-PE deposited by r.f.-PECVD', Diamond and Related Materials, Vol. 16, Issue 15, p. 1370, 2007 https://doi.org/10.1016/j.diamond.2006.11.095
  5. Y. Maemura, S.-C. Yang, and H. Fujiyama, 'Transport of negatively charged particles by E ${\times}$ B drift in silane plasmas', Surface and Coatings Technology, Vol. 98, Issues 1-3, p. 1420, 1998 https://doi.org/10.1016/S0257-8972(97)00257-0
  6. H. Fujiyama, Y. Tokitu, Y. Uchikawa, K. Kuwahara, K. Miyake, and A. Doi, 'Ceramics inner coating of narrow tubes by a coaxial magnetron pulsed plasma', Surface and Coatings Technology, Vol. 98, Issues 1-3, p. 1467, 1998 https://doi.org/10.1016/S0257-8972(97)00155-2
  7. L. Ji, H. Li, F. Zhao, J. Chen, and H. Zhou, 'Microstructure and mechanical properties of Mo/DLC nanocomposite films', Diamond and Related Materials, Vol. 17, Issue 11, p. 1949, 2008 https://doi.org/10.1016/j.diamond.2008.04.018
  8. 조욱, 양성채, '저온프로세스를 이용한 고분자 필름의 플라즈마 표면처리', 전기전자재료학회논문지, 21권, 5호, p. 486, 2008 https://doi.org/10.4313/JKEM.2008.21.5.486