Journal of the Korea Institute of Information and Communication Engineering (한국정보통신학회논문지)

The Korea Institute of Information and Commucation Engineering (한국정보통신학회)
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A Study on the Coupling of a Flanged Parallel-Plate Waveguide to a Nearby Conducting Strip from the Viewpoint of Near-Field Scanning Microscopy

근접주사현미경의 관점에서 플랜지된 평행평판 도파관과 근접도체스트립과의 결합에 관한 연구

  • 이종익 (동서대학교 전자공학과) ;
  • 고지환 (금오공과대학교 전자공학부) ;
  • 조영기 (경북대학교 전자전기컴퓨터학부)
  • Published : 2009.11.30
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Abstract

In this paper, the problem of electromagnetic coupling between a slit fed by a flanged parallel-plate waveguide (FPPW) and a nearby conducting strip parallel to the slit is studied as a simplified problem for a near-field scanning microscopy (NSM). The characteristics of the FPPW are investigated from the results for the variations of the equivalent slit admittance, the reactive powers near the slit inside and outside the FPPW, the magnitude and phase of the voltage reflection coefficient of the TEM wave. The performance of the proposed apparatus as an NSM is tested by examining the effects of various geometrical parameters such as guide height, slit width, strip width, distance between slit and strip, and the ratio of slit width to guide height on the magnitude and phase of the voltage reflection coefficient of the TEM wave. From the results for the voltage reflection coefficient against the strip offset from the slit, it is found that a slit in the FPPW with smaller guide height gives higher scanning resolution and the phase variation is more sensitive than the magnitude variation.

본 논문에서는 플랜지된 평행평판도파관으로 급전된 슬릿과 이에 평행하고 근접하는 도체 스트립과의 전자기적인 결합문제를 단순화된 근접주사현미 경의 관점에서 연구하였다. 슬릿의 등가어드미턴스, 슬릿근처 도파관 내부 및 외부의 무효전력, TEM파 전압반사계수의 크기 및 위상 등의 변화결과로부터 플랜지된 평행평판도파관의 특성을 조사하였다. 제안된 구조의 근접주사현미경으로서의 성능을 다양한 구조적인 파라미터들(도파관 높이, 슬릿의 폭, 스트립의 폭, 슬릿과 스트립 간격, 슬릿 폭과 도파관 높이의 비)이 TEM파 전압반사계수의 크기와 위상에 미치는 영향을 관찰하여 점검하였다. 슬릿으로부터 스트립의 변위에 따른 전압반사계수의 변화결과로부터 도파관의 높이가 작을 때 보다 높은 주사해상도를 얻을 수 있음과 반사계수의 크기 변화에 비해 위상변화가 훨씬 민감함을 확인하였다.

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References

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