Analytical Approach of Polymer Flow in Thermal Nanoimprint Lithography

열-나노임프린트 리소그래피 공정에서의 폴리머 유동에 대한 해석적 접근

  • 김국원 (순천향대학교 기계공학과) ;
  • 김남웅 (서울대학교 기계항공공학부 대학원)
  • Published : 2008.06.15

Abstract

Nanoimprint lithography(NIL) is becoming next generation lithography of significant interest due to its low cost and a potential patterning resolution of 10nm or less. Success of the NIL relies on the adequate conditions of pressure, temperature and time. To have the adequate conditions for NIL, one has to understand the polymer flowing behavior during the imprinting process. In this paper, an analytical approach of polymer flow in thermal NIL was performed based on the squeeze flow with partial slip boundary conditions. Velocity profiles and pressure distributions of the polymer flow were obtained and imprinting forces and residual thickness were predicted with the consideration of the slip velocity between the polymer and the mold/substrate. The results show that the consideration of the slip is very important for investigating the polymer flow in Thermal NIL.

Keywords

References

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