한국가시화정보학회지 (Journal of the Korean Society of Visualization)

  • 제5권1호
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  • Pages.3-8
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  • 2007
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  • 1598-8430(pISSN)
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  • 2093-808X(eISSN)
한국가시화정보학회 (The Korean Society of Visualization)
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모세관 리소그라피를 이용한 고종횡비 나노구조 형성법

Capillary-driven Rigiflex Lithography for Fabricating High Aspect-Ratio Polymer Nanostructures

  • 정훈의 (서울대학교 기계항공공학부) ;
  • 이성훈 (서울대학교 기계항공공학부) ;
  • 김필남 (서울대학교 기계항공공학부) ;
  • 서갑양 (서울대학교 기계항공공학부)
  • 발행 : 2007.06.30
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초록

We present simple methods for fabricating high aspect-ratio polymer nanostructures on a solid substrate by rigiflex lithography with tailored capillarity and adhesive force. In the first method, a thin, thermoplastic polymer film was prepared by spin coating on a substrate and the temperature was raised above the polymer's glass transition temperature ($T_g$) while in conformal contact with a poly(urethane acrylate) (PUA) mold having nano-cavities. Consequently, capillarity forces the polymer film to rise into the void space of the mold, resulting in nanostructures with an aspect ratio of ${\sim}4$. In the second method, very high aspect-ratio (>20) nanohairs were fabricated by elongating the pre-formed nanostructures upon removal of the mold with the aid of tailored capillarity and adhesive force at the mold/polymer interface. Finally, these two methods were further used to fabricate micro/nano hierarchical structures by sequential application of the molding process for mimicking nature's functional surfaces such as a lotus leaf and gecko foot hairs.

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참고문헌

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