Study of Composite channel Structure of Metamorphic HEMT for the Improved Device Characteristics

기존의 MHEMT와 InP 합성 채널 MHEMT의 소자의 항복 특성 분석 및 비교 연구

  • Choi, Seok-Gyu (MINT, Millimeter-wave INovation Technology research center) ;
  • Baek, Yong-Hyun (MINT, Millimeter-wave INovation Technology research center) ;
  • Han, Min (MINT, Millimeter-wave INovation Technology research center) ;
  • Bang, Seok-Ho (MINT, Millimeter-wave INovation Technology research center) ;
  • Yoon, Jin-Seob (Department of computer aided system, Seoil College) ;
  • Rhee, Jin-Koo (MINT, Millimeter-wave INovation Technology research center)
  • 최석규 (동국대학교 전자공학과 밀리미터파 신기술 연구센터) ;
  • 백용현 (동국대학교 전자공학과 밀리미터파 신기술 연구센터) ;
  • 한민 (동국대학교 전자공학과 밀리미터파 신기술 연구센터) ;
  • 방석호 (동국대학교 전자공학과 밀리미터파 신기술 연구센터) ;
  • 윤진섭 (서일대학 컴퓨터전자과) ;
  • 이진구 (동국대학교 전자공학과 밀리미터파 신기술 연구센터)
  • Published : 2007.12.25

Abstract

In this study, we have performed the channel modification of the conventional MHEMT (metamorphic high electron mobility transistor) to improve the breakdown characteristics. The Modified channel consists of the InxGal-xAs channel and the InP sub channel instead of the InxGa1-xAs channel. Since InP has the lower impact ionization coefficient in comparison with In0.53Ga0.47As, we have adopted the InP-composite channel in the modified MHEMT. We have investigated the breakdown mechanism and the RF characteristics for the conventional and the InP- composite channel MHEMTs. From the measurement results, we have obtained the enhanced on and off-state breakdown voltages of 2.4 and 5.7 V, respectively. Also, the increased RF characteristics have brought about the decreased output conductance for the InP-composite channel MHEMT. The cut-off frequency (fT) and the maximum oscillation frequency (fmax) for the InP-composite Channel MHEMT were 160 GHz and 230 GHz, respectively. It has been shown that the InP-composite channel MHEMT has the potential applications for the millimeter wave power device.

본 논문에서 기존에 사용하고 있는 metamorphic high electron transistor (MHEMT)의 채널에 InP를 추가하여 제작 하였다. InP는 In0.53Ga0.47As와 비교하여 낮은 충돌 이온화 계수를 가지고 있다. 그런 특성을 MHEMT의 문제점 중의 하나인 낮은 항복전압의 개선에 이용하였다. 우리는 기존의 MHEMT와 InP 합성 채널 MHEMT의 항복 특성과 주파수 특성을 비교 하였다. 본 논문에서 InP 합성 채널 MHEMT의 on-state와 off-state 항복전압이 각각 2.4와 5.7 V가 측정 되었고 또한 cut-off 주파수와 maximum oscillation 주파수는 각각 160 GHz와 230 GHz가 측정 되었다. 위의 결과는 InP 합성 채널 MHEMT가 밀리미터파 대역의 전력용 소자에 이용되는데 큰 장점을 갖는 소자임을 알 수 있다.

Keywords

References

  1. T. Enoki, K. A. Kohzen, and Y. Ishii, 'Design and Characteristics of InGaAs/InP Composite- Channel HFET's' IEEE Transactions on Electron Device. Vol. 42, NO. 8 1413 (1995)
  2. C. Gasler, V. Ziegler, C. Wök, R. Deufel, F. J. Berlec, , 'Metamorphic HFETs on GaAs with InP-subchannels for device perpormance improvements,' 2000IEEE International Electron Device Meeting. 8.3.1 (2000)
  3. J.B. Shealy, T.Liu, R. Virk, J. Pusl, and C. Ngo, 'K-Band High-Power/Efficiency/Breakdown GaInAs/InP Composite Channel HEMT's,' IEEE Microwave and Guided Wave Latt, Vol. 7. NO. 9, 1997 pp. 261
  4. P. Chevalier, X. Wallart, F.Mollot, B. Bonte and R, Fauqenmbergue, 'COMPOSITE CHENNEL HEMTs FOR MILLIMETER-WAVE POWER APPLCATIONS,' 10th Intern. Conf. on Indium Phosphide and Materials. 207 (1998)
  5. B. H. Lee, S. D. Kim, J. K. Rhee, 'Small-Signal Analysis of High Maximum Frequency of Oscillation $0.1-{\mu}m$ Off-Set Gamma-Shaped Gate InGaAs/InAlAs/GaAs Metamorphic High-Electron- Mobility Transistors', Jpn. J. Appl. Phys., Vol. 43, PP 1914-1918, 2004 https://doi.org/10.1143/JJAP.43.1914
  6. W. S. Sul, D, H, Shin, J. K. Rhee, 'Sub $0.1-{\mu}m$ Asymmetric Gamma-gate PHEMT Process Using Electron Beam Lithography,' in proceeding of Materials Research Society 2002 Spring Meeting, San Francisco, CA, p.169, Apr. 2002
  7. S. C. KIM, B. O. Lim, H, S, Kim, S. D. Lee, B. H. Lee, W. S. Sul, D. H. Shin, and J. K. Rhee, 'Sub $0.1-{\mu}m$ Asymmetric $\Gamma-gate$ PHEMT process using electron beam lithography,' in proceedings of 28th international Symposium Compound Semiconductors, pp. 95-100, 2001
  8. B. H. Lee, D. An, M. K. Lee, B. O. Lim, S. D. Kim, and J. K. Rhee, 'Two-stage broadband high gain W-band amplifier using $0.1-{\mu}m$ metamorphic HEMT technology', IEEE Electron Device Letters, Vol. 25, PP 766-768, Dec. 2004 https://doi.org/10.1109/LED.2004.838506
  9. Hae-Sung Kim, Byeong-Ok Lim, Sung-Chan Kim, Seong-Dae Lee, Dong-Hoon Shin and Jin-Koo Rhee, 'Studies of the fabrication of PHEMTs for a $0.1-{\mu}m$scale ${\Gamma}-gate$ using electron beam lithography: structure, fabrication, and characteristics,' Microelectronic Engineering, vol. 63, issue 4, pp. 419-431, 2002
  10. J. W. Shin, Y. S. Yoon, S. D. Lee, H. C. Park and J. K. Rhee, 'Effects of He gas on hydrogen content and passivation of GaAs PHEMT with SiN films,' 2000 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices (AWAD), 2000, pp. 121-124
  11. M. Boudrissa, E. Delos, X. Wallaert and D. Théon, Member, IEEE, and J,C,De Jaeger, 'A $0.15-{\mu}m$ 60-GHz High-Power Composite Channel GaInAs/InP HEMT with Low Gate Current' IEEE Electron Device Letter, Vol. 22, NO. 6, June 2001
  12. Gaudenzio Meneghess, Alvise Mion, Andrea Neviani, Mehran Matoubial, Julia Brown, Madjid Hafizi, Takyiu Liu, Claudio Canal, Maura Pavesi, Manfredi, and Enrico Zanoni 'Effect of channel quantization and temperature on off-state and on-stage breakdown in composite channel and conventional InP-based HEMT's,' Electron Devices Meeting, 1996., International 8-11 Dec. 1996 pp. 43 - 46
  13. Hin-Fai Chau and Dimitris Pavlidis, 'A physics-based fitting and expolation method for measured impact ionization coefficient in III-V semiconductor,' J.Appl. Phys. 72 (2), 15 July 1992 pp. 531 - 538 https://doi.org/10.1063/1.351884
  14. Meneghesso, G. Neviani, A. Oesterholt, R. Matloubian, M. Liu, T. Brown, J.J. Canali, C. Zanoni, E, 'On-state and off-state breakdown in GaInAs/InP composite-channel HEMT's with variable GaInAs channel thickness' IEEE Electron Devices, Transactions on Vol 46,Issue 1,Jan. 1999 pp. 2 - 9
  15. Hara, N. Okamoto, N. Imanishi, K. Sawada, K. Takahashi, T. Makiyama, K. Takikawa, M. 'Improvement in Reliability InP-Based HEMTs by supressing impact ionization' Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on 31 May-4 June 2004 pp. 615 - 618
  16. Ladner, C.; Berthelemot-Aupetit, C.; Decobert, J.; Harmand, J.-C.; Post, G.; Vigier, P.; Dumas, J.-M. 'Comparative investigation of gate leakage current in single and double channel InP HEMT,' Indium Phosphide and RelatedMaterials, 1998 International Conference on 11-15 May 1998 pp, 505 - 508
  17. Webster RT, Wu S, Anwar AFM. 'Impact ionization in InAlAs/InGaAs/InAlAs HEMT's,' IEEE Electron Device Letter 2000. 21(5), pp. 193-5 https://doi.org/10.1109/55.841293
  18. Mark Isler 'Investigation and modeling of impact ionization in HEMTs for DC and RF operating condition,' Solid-state Electronics 46 2002, pp. 1587-1593 https://doi.org/10.1016/S0038-1101(02)00110-7
  19. M. Chertouk, H. Heib, D. Xu, S. Kraus, W. Klein, G. Böm, G. Träkle and G. Weimann 'METAMORPHIC InAlAs/InGaAs HEMTs ON GaAs SUBSTRATES WITH COMPOSITE CHANNELS AND fmax of 350 GHz,' Indium Phosphide and Related Materials, 1995 Conference Proceedings. Seventh International Conference on 9-13 May 1995 pp. 737 - 740
  20. J. A. del Alamo and M. H. Somerville 'Breakdown in millimeter-wave power InP HEMTs: a comparison with GaAs PHEMT's,' IEEE Journal of Solid-State Circuits, Vol 34,9,1999 pp. 1204 - 1211 https://doi.org/10.1109/4.782077
  21. Wang, S.C. Liu, J.S. Hwang, K.C. Kong, W. Tu, D.W. Ho, P. Mohnkern, L. Nichols, K. Chao, P.C. 'High performance fully selective double recess InAlAs/InGaAs/InP HEMTs,' IEEE Electron Device Letters, Vol 21,Issue 7,July 2000 pp. 335 - 337 https://doi.org/10.1109/55.847372
  22. M. Amano, S. Fujita, S. Hosoi, T. Noda, A. Sasaki, and Y. Ashizawa, 'InAlAs/InGaAs HEMT using InGaP Schottky contact layer,' in Proc. Int. Conf. InP and Related Materials, 1995, pp. 416-419