Modification of the curing characteristics of the photocurable resin FA1260T for 3D microfabrication using microstereolithography

삼차원 마이크로광조형 기술 응용을 위한 광경화 수지 EA1260T의 경화특성 조절에 대한 연구

  • 김성훈 (광주과학기술원 대학원 기전공학과) ;
  • 정대준 (한국항공우주연구원 위성응용그룹) ;
  • 주재영 (광주과학기술원 대학원 기전공학과) ;
  • 정성호 (광주과학기술원 기전공학과)
  • Published : 2006.06.01

Abstract

The curing characteristics of a photocurable resin are critical factors that often decide the ultimate resolution and structural sharpness of a final product fabricated by microstereolithography$(\mu-STL)$. In this study, we investigated the curing characteristics of the FA1260T photopolymer under a visible laser light of 42nm wavelength. Modification of the curing property of the FA1260T is attempted to reduce the cure depth $(D_c)$ by adding a radical quencher to the resin. Also, an organic solvent was used to reduce the resin viscosity for an improvement of the flatness of the liquid surface during layer-by-layer curing. As a result, the minimum $D_c$ has been reduced over a factor of 3 with no abrupt increase. Samples of three dimensional microstructures fabricated using the modified FA1260T are presented.

Keywords

References

  1. Ikuta, K. and Hirowatari, K., 'Real three dimensional micro fabrication using stereo lithography and metal molding,' Proc. IEEE MEMS, pp. 42-47,1993 https://doi.org/10.1109/MEMSYS.1993.296949
  2. Katagi, T. and Nakajima, N., 'Photo forming applied to fine machining,' Proc. IEEE MEMS, pp. 173-178, 1993
  3. Zhang, X., Jiang, X. N. and Sun, C.. 'Microstereolithogrphy of polymeric and ceramic microstructures,' Sensors and Actuators A: physical, Vol. 77, pp. 149-156, 1999 https://doi.org/10.1016/S0924-4247(99)00189-2
  4. Ikuta, K., Maruo, S. and Kojima, S., 'New microstereolithography for freely moved 3D micro structure-super IH process with submicron ?resolution,' Proc. IEEE MEMS, pp. 290-295, 1998
  5. Maruo, S., Ikuta, K. and Korogi, H., 'Submicron manipulation tools driven by light in a liquid,' Appl. Phys. Lett., Vol. 82, pp. 133-135,2003 https://doi.org/10.1063/1.1533853
  6. Kawata, S. and Sun, H. B., 'Two-photon photopolymerization as a tool for making microdevices,' Appl. Surf. Sci., Vol. 208-209, pp. 153-158, 2003 https://doi.org/10.1016/S0169-4332(02)01358-2
  7. Conrad, P. G., Nishmura, P. T., Aherne, D., Schwartz, B. J., Wu, D., Fang, N., Zhang, X., Roberts, J. and Sha, K. J., 'Functional Molecularly Imprinted Polymer Microstructures Fabricated Using Microstereolithography,' Adv. Mater., Vol. 15, No. 18, pp. 1541-1544, 2003 https://doi.org/10.1002/adma.200304602
  8. Kuebler, S. M., Rumi, M., Watanabe, T., Braun, K., Cumpston, B. H., Heikal, A. A., Erskine, L. L., Thayumanavan, S., Barlow, S., Marder, S. and Perry, J. W., 'Optimizing Two-Photon Initiators and Exposure conditions for Three-Dimensional Lithographic Microfabrication,' J. Photopolym. Sci. Tech., Vol. 14, No.4, pp. 657-668, 2001 https://doi.org/10.2494/photopolymer.14.657
  9. Farsari, M., Huang, S., Young, R. C. D., Heywood, M. I., Morrell, P. J. B. and Charwin, C. R., 'Fourwave mixing studies of UV curable resins for microstereolithography,' J. Photo chern. Photobiol. A: Chem., Vol. 115, pp. 81-87,1998 https://doi.org/10.1016/S1010-6030(98)00242-1
  10. Sun, H. B. and Kawata, S., 'Two-Photon Laser Precision Microfabrication and Its Applications to Micro-Nano Devices and Systems,' J. Lightwave Tech., Vol. 21, No.3, pp. 624-633, 2003 https://doi.org/10.1109/JLT.2003.809564
  11. Takada, K., Sun, H. B. and Kawata, S., 'Improved spatial resolution and surface roughness in photopolymerization based laser nanowriting,' Appl. Phys. Lett., Vol. 86, pp. 071122, 2005 https://doi.org/10.1063/1.1864249
  12. Cutie, S. S., Henton, D. E., Powell, C., Reim, R. E., Smith, R. B. and Staples, T. L., 'The Effect of MEHQ on the Polymerization of Acrylic Acid in the Preparation of Superabsorbent Gels,' J. Appl. Polym. Sci, Vol. 64, pp. 577-589, 1997 https://doi.org/10.1002/(SICI)1097-4628(19970418)64:3<577::AID-APP14>3.0.CO;2-V
  13. Jung, D. J., Kim, S. H. and Jeong, S. H., 'Shape accuracy and curing characteristics of photopolymer during fabrication of three-dimensional microstructures using microstereolithography,' J. of KSPE, Vol. 21, No.1, pp. 46-50, 2004