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Modification of the curing characteristics of the photocurable resin FA1260T for 3D microfabrication using microstereolithography  

Kim Sung-Hoon (광주과학기술원 대학원 기전공학과)
Jung Dae-Jun (한국항공우주연구원 위성응용그룹)
Joo Jae-Young (광주과학기술원 대학원 기전공학과)
Jeong Sung-Ho (광주과학기술원 기전공학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.23, no.6, 2006 , pp. 174-179 More about this Journal
Abstract
The curing characteristics of a photocurable resin are critical factors that often decide the ultimate resolution and structural sharpness of a final product fabricated by microstereolithography$(\mu-STL)$. In this study, we investigated the curing characteristics of the FA1260T photopolymer under a visible laser light of 42nm wavelength. Modification of the curing property of the FA1260T is attempted to reduce the cure depth $(D_c)$ by adding a radical quencher to the resin. Also, an organic solvent was used to reduce the resin viscosity for an improvement of the flatness of the liquid surface during layer-by-layer curing. As a result, the minimum $D_c$ has been reduced over a factor of 3 with no abrupt increase. Samples of three dimensional microstructures fabricated using the modified FA1260T are presented.
Keywords
Photocurable resin; Radical quencher; Microstereolithography; Microfabrication;
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Times Cited By KSCI : 1  (Citation Analysis)
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