Thin Film Bulk Acoustic Resonators for RF Applications

  • Linh, Mai (School of Information and Communications University(ICU)) ;
  • Lee, Jae-Young (School of Information and Communications University(ICU)) ;
  • Yoon, Gi-Wan (School of Information and Communications University(ICU))
  • Published : 2006.09.30

Abstract

A new thin film deposition technique of piezoelectric ZnO film and its successful application for film bulk: acoustic resonator (FBAR) devices are presented. The two-step deposition used seems to be able to deposit ZnO film with a highly preferred orientation. The FBAR devices with the ZnO films show an excellent return loss of $35{\sim}50$ dB at $1.5{\sim}2$ GHz.

Keywords

References

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