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Thin Film Bulk Acoustic Resonators for RF Applications  

Linh, Mai (School of Information and Communications University(ICU))
Lee, Jae-Young (School of Information and Communications University(ICU))
Yoon, Gi-Wan (School of Information and Communications University(ICU))
Abstract
A new thin film deposition technique of piezoelectric ZnO film and its successful application for film bulk: acoustic resonator (FBAR) devices are presented. The two-step deposition used seems to be able to deposit ZnO film with a highly preferred orientation. The FBAR devices with the ZnO films show an excellent return loss of $35{\sim}50$ dB at $1.5{\sim}2$ GHz.
Keywords
Resonator; Bragg reflector; Quality factor Q; return loss S11;
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