상온저압 나노임프린트 리소그래피 기술

Room-temperature and low-pressure nanoimprint lithography technology

  • 정준호 (한국기계연구원 지능형정밀기계연구부) ;
  • 이응숙 (한국기계연구원 지능형정밀기계연구부)
  • 발행 : 2005.02.01

초록

키워드

참고문헌

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  2. Chou, S.Y., Krauss, P.R. and Renstrom, P.J., 'Nanoimprint lithography,' J. Vac. Sci. Technol. B Vol. 14(6), pp. 4129-4133, 1996 https://doi.org/10.1116/1.588605
  3. Haisma, J., Verheijen, M. and Heuvel, K., 'Moldassisted nanolithography: A process for reliable pattem replication,' J. Vac. Sci. Technol. B, Vol. 14(6), pp. 4124-4128, 1996 https://doi.org/10.1116/1.588604
  4. Bender,M., Otto, M., Hadam,B.,Spangenberg, B. and Kurz, H., 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., Vol. 61-62, pp. 407-413, 2002 https://doi.org/10.1016/S0167-9317(02)00470-7
  5. Otto, M., Bender, M., Richter, F., Hadam, B., Kliem, T., Jede, R., Spangenberg, B. And Kurz, H., 'Reproducibility and homegeneity in step and repeat UV-nanoimprint lithography', Microelectronics Eng., in press, 2004 https://doi.org/10.1016/S0167-9317(04)00090-5
  6. Austin, M.D., Ge H., Wu W., Li m., Yu Z., Wasserman D., Lyon S.A., and Chou S.Y., 'Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography,' Appl. Phys. Lett. Vol.84, No.26, pp.5299-5301, 2004 https://doi.org/10.1063/1.1766071
  7. Colburn, M., Johnson, S., Stewatr, M., Damle, S., Bailey, T., Choi, B., Wedlake, M., Michaelson, T., Sreenivasan, S.V., Ekerdt, J. and Wilson, C.G., in SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676(1), pp.379-390, 1999
  8. Sreenivasan, S.V., 'Nanoimprint lithography using UV curable liquids,' in ASME International Conference on Integrated Nanosystems, Berkeley, CA, September 18-20, 2002
  9. Jeong, J.H., Sim, Y.S., Sohn, H.K. and Lee, E.S., 'UV-nanoimprint lithography using an elementwise patterned stamp,',Microelectron. Eng., Vol. 75, No.2, pp.165-171, 2004 https://doi.org/10.1016/j.mee.2004.04.003
  10. Sim Y.S., Jeong, J.H., Sohn, H.K. Shin, Y.J., Lee, E.S., Choi, S.W. and Kim,J.H., 'Nano-patterning technology using an UV-NIL method, 'Journal of the Korean Vacuum Society, Vol.13, No.1 pp.39-45, 2004