Browse > Article

Room-temperature and low-pressure nanoimprint lithography technology  

Jeong Jun-ho (한국기계연구원 지능형정밀기계연구부)
Lee Eung-sug (한국기계연구원 지능형정밀기계연구부)
Publication Information
Journal of the Korean Society for Precision Engineering / v.22, no.2, 2005 , pp. 7-15 More about this Journal
Keywords
Nanoimprint lithography; Nanofabrication; Nanostructure; Nanomanufacturing;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 Colburn, M., Johnson, S., Stewatr, M., Damle, S., Bailey, T., Choi, B., Wedlake, M., Michaelson, T., Sreenivasan, S.V., Ekerdt, J. and Wilson, C.G., in SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676(1), pp.379-390, 1999
2 Sreenivasan, S.V., 'Nanoimprint lithography using UV curable liquids,' in ASME International Conference on Integrated Nanosystems, Berkeley, CA, September 18-20, 2002
3 Jeong, J.H., Sim, Y.S., Sohn, H.K. and Lee, E.S., 'UV-nanoimprint lithography using an elementwise patterned stamp,',Microelectron. Eng., Vol. 75， No.2， pp.165-171, 2004   DOI   ScienceOn
4 Sim Y.S., Jeong, J.H., Sohn, H.K. Shin, Y.J., Lee, E.S., Choi, S.W. and Kim，J.H., 'Nano-patterning technology using an UV-NIL method, 'Journal of the Korean Vacuum Society, Vol.13, No.1 pp.39-45, 2004   과학기술학회마을
5 Chou, S.Y., Krauss, P.R. and Renstrom, P.J., 'Imprint of sub-25 nm vias and trenches in polymers,' Appl. Phys. Lett. Vol.67, No.21, pp.3114-3116 ,1995   DOI   ScienceOn
6 Chou, S.Y., Krauss, P.R. and Renstrom, P.J., 'Nanoimprint lithography,' J. Vac. Sci. Technol. B Vol. 14(6), pp. 4129-4133, 1996   DOI   ScienceOn
7 Haisma, J., Verheijen, M. and Heuvel, K., 'Moldassisted nanolithography: A process for reliable pattem replication,' J. Vac. Sci. Technol. B, Vol. 14(6), pp. 4124-4128, 1996   DOI   ScienceOn
8 Bender，M., Otto, M.， Hadam，B.，Spangenberg, B. and Kurz, H., 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., Vol. 61-62, pp. 407-413， 2002   DOI   ScienceOn
9 Otto, M., Bender, M., Richter, F., Hadam, B., Kliem, T., Jede, R., Spangenberg, B. And Kurz, H., 'Reproducibility and homegeneity in step and repeat UV-nanoimprint lithography', Microelectronics Eng., in press, 2004   DOI
10 Austin, M.D., Ge H., Wu W., Li m., Yu Z., Wasserman D., Lyon S.A., and Chou S.Y., 'Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography,' Appl. Phys. Lett. Vol.84, No.26, pp.5299-5301, 2004   DOI   ScienceOn