Hydrogenated a-Si TFT Using Ferroelectrics

비정질실리콘 박막 트랜지스터

  • 허창우 (목원대학교 전자정보보호공학부)
  • Published : 2005.06.01

Abstract

In this paper. the a-Si:H TFT using ferroelectric of $SrTiO_3$ as a gate insulator is fabricated on glass. High k gate dielectric is required for on-current, threshold voltage and breakdown characteristics of TFT Dielectric characteristics of ferroelectric are superior to $SiO_2$ and $Si_3N_4$. Ferroelectric increases on-current and decreases threshold voltage of TFT and also ran improve breakdown characteristics.$SrTiO_4$ thin film is deposited by e-beam evaporation. Deposited films are annealed for 1 hour in N2 ambient at $150^{\circ}C\~600^{\circ}C$. Dielectric constant of ferroelectric is about 60-100 and breakdown field is about IMV/cm. In this paper, the TFT using ferroelectric consisted of double layer gate insulator to minimize the leakage current. a-SiN:H, a-Si:H (n-type a-Si:H) are deposited onto $SrTiO_3$ film to make MFNS(Metal/ferroelectric/a-SiN:H/a-Si:H) by PECVD. In this paper, TFR using ferroelectric has channel length of$8~20{\mu}m$ and channel width of $80~200{\mu}m$. And it shows that drain current is $3.4{\mu}A$at 20 gate voltage, $I_{on}/I_{off}$ is a ratio of $10^5\~10^8,\;and\;V_{th}$ is$4\~5\;volts$, respectively. In the case of TFT without having ferroelectric, it indicates that the drain current is $1.5{\mu}A$ at 20gate voltage and $V_{th}$ is $5\~6$ volts. If properties of the ferroelectric thin film are improved, the performance of TFT using this ferroelectric thin film can be advanced.

강유전체$(SrTiO_3)$ 박막을 게이트 절연층으로 하여 수소화 된 비정질 실리콘 박막 트랜지스터를 유리 기판 위에 제조하였다. 강유전체는 기존의 $SiO_2,\;SiN$ 등과 같은 게이트 절연체에 비하여 유전특성이 매우 뛰어나 TFT의 ON 전류를 증가시키고 문턱전압을 낮추며 항복특성을 개선하여 준다. PECVD에 의하여 증착된 a-Si:H는 FTIR 측정 결과 $2,000cm^{-1}$$876cm^{-1}$에서 흡수 밴드가 나타났으며, $2,000cm^{-1}$$635cm^{-1}$$SiH_1$의 stretching과 rocking 모드에 기인한 것이며 $876cm^{-1}$의 weak 밴드는 $SiH_2$ vibration 모드에 의한 것이다. a-SiN:H는 optical bandgap이 2.61 eV이고 굴절률은 $1.8\~2.0$, 저항률은 $10^{11}\~10^{15}\Omega-cm$ 정도로 실험 조건에 따라 약간 다르게 나타난다. 강유전체$(SrTiO_3)$ 박막의 유전상수는 $60\~100$ 정도이고 항복전계는 IMV/cm 이상으로 우수한 절연특성을 갖고 있다. 강유전체를 이용한 TFT의 채널 길이는 $8~20{\mu}m$, 채널 넓이는 $80~200{\mu}m$로서 드레인 전류가 게이트 전압 20V에서 $3.4{\mu}A$이고 $I_{on}/I_{off}$ 비는 $10^5\~10^8,\;V_{th}$$4\~5\;volts$이다.

Keywords

References

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