References
-
Y. Zhu, H. Lu, and X. Pen, 'Characterization of
$SnO_2$ films deposited by d. c. gas discharge activating reaction evaporation onto amorphous and crystalline substrates', Thin Solid Films, Vol. 224, p 82,1993 https://doi.org/10.1016/0040-6090(93)90462-X -
D. Mutschall and E. Obermeier, 'A capacitive
$CO_2$ sensor with on chip heating, Tech', Dig. 5th IntI. Mtg. on Chem. Sensors, Rome, p. 526, 1994 -
C. C. Chai, J. Peng, and B. P. Yan, 'Preparation and gas-sensing properties of \alpha-
$Fe_2O_3$ thin films', J. Electron. Mat., Vol. 24, p. 799, 1995 https://doi.org/10.1007/BF02653327 -
Y. Nakatani, M. Sakai, and M. Matsuoka, 'Enhancement of gas sensitivity by controlling microstructure of
$\alpha$ -$Fe_2O_3$ ceramics', Jpn. J. Appl. Phys., Vol. 22, No. 6,p. 912, 1983 https://doi.org/10.1143/JJAP.22.912 -
Y. Nakatani and M. Matsoka, 'Effects of sulfate ion on gas sensitive properties of
$\alpha$ -$Fe_2O_3$ ceramics', Jpn. J. Appl. Phys., Vol. 21, p. 758,1982 https://doi.org/10.1143/JJAP.21.L758 -
C. Cantalini anM. Pelino, 'Microstructure and humidity sensitive d characteristics of
$\alpha$ -$Fe_2O_3$ ceramic sensor, J. Am. Ceramics. Soc., Vol. 75, p. 546,1992. https://doi.org/10.1111/j.1151-2916.1992.tb07840.x -
J. H. Han, A. B. Yu, F. J. He, and T. Yao, "A study of the gas sensitivity of
$\alpha- Fe_2O_3$ sensors to CO and$CH_4$ , J. Mater. Sci. Lett., Vol. 15, p. 434, 1996 -
J. Z. Jiang, R. Lin, W. Lin, K. Nielsen, S. Morup, K. Dam-Johansen, and R. Clasen, 'Gas-sensitive properties and structure of nanostructured
$\alpha-Fe_2O_3x-(SnO_2)$ l-x materials prepared by mechanical alloying', J. Phys. D: Appl. Phys., Vol. 30, p. 1459,1997 https://doi.org/10.1088/0022-3727/30/10/012 - Eun-Tae-Lee, Bum-Jin Kim, and Gun-Eik Jang, 'Characterization of U-FeZ03 thin films processed by Plasma Enhanced Chemical Vapor Deposition (PECVD)', Thin solid films, Vol. 341, p. 73, 1999 https://doi.org/10.1016/S0040-6090(98)01530-2
- J. A. Thornton, J. Vac. Sci. Tech., Vol. 15, p. 188, 1987 https://doi.org/10.1116/1.569452