ETRI Journal

Electronics and Telecommunications Research Institute (한국전자통신연구원)
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A New SOI LDMOSFET Structure with a Trench in the Drift Region for a PDP Scan Driver IC

  • Son, Won-So (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
  • Kim, Sang-Gi (Basic Research Laborotory, ETRI) ;
  • Sohn, Young-Ho (School of Electrical Engineering and Computer Science, Yeungnam University) ;
  • Choi, Sie-Young (School of Electrical Engineering and Computer Science, Kyungpook National University)
  • Received : 2003.09.09
  • Published : 2004.02.29
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Abstract

To improve the characteristics of breakdown voltage and specific on-resistance, we propose a new structure for a LDMOSFET for a PDP scan driver IC based on silicon-on-insulator with a trench under the gate in the drift region. The trench reduces the electric field at the silicon surface under the gate edge in the drift region when the concentration of the drift region is high, and thereby increases the breakdown voltage and reduces the specific on-resistance. The breakdown voltage and the specific on-resistance of the fabricated device is 352 V and $18.8 m{\Omega}{\cdot}cm^2$ with a threshold voltage of 1.0 V. The breakdown voltage of the device in the on-state is over 200 V and the saturation current at $V_{gs}=5V$ and $V_{ds}$=20V is 16 mA with a gate width of $150{\mu}m$.

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