Electrical Characteristics of InAlAs/InGaAs/InAlAs Pseudomorphic High Electron Mobility Transistors under Sub-Bandgap Photonic Excitation

  • Kim, H.T. (School of Electrical Engineering, Kookmin University) ;
  • Kim, D.M. (School of Electrical Engineering, Kookmin University)
  • 발행 : 2003.09.01

초록

Electrical gate and drain characteristics of double heterostructure InAlAs/InGaAs pseudomorphic HEMTs have been investigated under sub-bandgap photonic excitation ($hv). Drain $(V_{DS})-,{\;}gate($V_{DS})-$, and optical power($P_{opt}$)-dependent variation of the abnormal gate leakage current and associated physical mechanisms in the PHEMTs have been characterized. Peak gate voltage ($V_{GS,P}$) and the onset voltage for the impact ionization ($V_{GS.II}$) have been extracted and empirical model for their dependence on the $V_{DS}$ and $P_{opt} have been proposed. Anomalous gate and drain current, both under dark and under sub-bandgap photonic excitation, have been modeled as a parallel connection of high performance PHEMT with a poor satellite FET as a parasitic channel. Sub-bandgap photonic characterization, as a function of the optical power with $h\nu=0.799eV$, has been comparatively combined with those under dark condition for characterizing the bell-shaped negative humps in the gate current and subthreshold drain leakage under a large drain bias.

키워드

참고문헌

  1. S. Maruno, Y. Abe, T. Ozeki, T. Nakamoto, and N. Yoshida, 'Isothermal capacitance transient spectroscopy of pseudomorphic high-electron-mobility transistors,' Appl. Phys. Lett., Vol. 82, pp. 3339-3341, May 2003 https://doi.org/10.1063/1.1572555
  2. S.D. Cho, H.T. Kim, and D.M. Kim, 'Physical mechanisms on the abnormal gate leakage currents in pseudomorphic high electron mobility transistors,' IEEE Trans. Electron Devices, Vol.50, no.4, pp.1148-1152, April 2003 https://doi.org/10.1109/TED.2003.812493
  3. R. Menozzi, 'Hot electron effects and degradation of GaAs and InP HEMTs for microwave and millimetrewave applications,' Semiconductor Science Technology, Vol. 13, pp. 1053-1063, Oct. 1998 https://doi.org/10.1088/0268-1242/13/10/001
  4. S. Takamiya, M. Harayama, T. Sugimura, T. Tsuzuku, T. Taya, K. Iiyama, and S. Hashimoto, 'Reverse currents of Schottky gates of III-V MESFET/HEMTS: field emission and tunnel currents,' Solid-State Electronics, Vol. 42, pp. 447-451, March 1998 https://doi.org/10.1016/S0038-1101(97)00264-5
  5. G. Meneghesso, A. Neviani, R. Oesterholt, M. Matloubian, T. Liu, J.J. Brown, C. Canali, and E. Zanoni, 'On-state and off-state breakdown in GaInAs/InP composite-channel HEMT's with variable GaInAs channel thickness,' IEEE Trans. Electron Devices, Vol. 46, pp.2-9, Jan. 1999 https://doi.org/10.1109/16.737434
  6. R.T. Webster, S. Wu, and A.F.M. Anwar, 'Impact ionization in InAlAs/InGaAs/InAlAs HEMT's,' IEEE Electron Device Lett., Vol.21, pp.193-195, May 2000 https://doi.org/10.1109/55.841293
  7. D.-H. Kim, S.-W. Kim, S.-C. Hong, S.-W. Paek, J.-H. Lee, K.-W. Jung, and K.-S. Seo, 'fabrication and characterization of $0.2{\mu}m$ InAlAs/InGaAs M-HEMT's with inverse step-graded InAlAs buffer on GaAs substrate,' J. Semiconductor Tech. and Science, Vol.1, pp.111-115, 2001
  8. S. Takatani, H. Matsumoto, J. Shigeta, K. Ohshika, T. Yamashita, and M. Fukui, 'Generation mechanism of gate leakage current due to reverse-voltage stress i-AlGaAs/n-GaAs HIGFET's,' IEEE Trans. Electron Devices, Vol. 45, pp.14-20, Jan. 1998 https://doi.org/10.1109/16.658806
  9. B. Georgescu, M.A. Py, A. Souifi, and G. Guilot, 'New aspects and mechanism of kink effect in InAlAs/InGaAs/InP inverted HFET's,' IEEE Electron Device Lett., Vol. 19, pp.154-156, May 1998 https://doi.org/10.1109/55.669733
  10. N. Labat, N. Saysset, A. Touboul, Y. Danto, P. Cova and F. Fantini, 'Analysis of hot electron degradations in pseudomorphic HEMTs by DCTS and LF noise characterization,' Microelectronics Reliability, Vol.37, pp. 1675-1678, Oct. 1997 https://doi.org/10.1016/S0026-2714(97)00137-6
  11. Y. C. Chou, G. P. Li, Y. C. Chen, C.S. Wu, K.K. Yu, and T. A. Midford, 'Off-state breakdown effects on gate leakage current in power pseudomorphic AlGaAs/InGaAs HEMTs,' IEEE Electron Device Lett., Vol.18, pp. 479-481, Oct. 1996 https://doi.org/10.1109/55.537081
  12. M. H. Somerville, J. A. del Alamo, and P. Saunier, 'Offstate breakdown in power pHEMTs: the impact of the source,' IEEE Trans. Electron Devices, Vol. 45, pp. 1883-1889, Sept. 1998 https://doi.org/10.1109/16.711351
  13. D.-H. Kim, S.-J. Kim, Y.-H. Kim, S.-W. Kim, and K.-S. Seo, '40nm InGaAs HEMT's with 65% strained channel fabricated with damage-free $SiO_2/SiN_x$ side-wall gate process,' J. Semiconductor Tech. and Science, Vol.3, pp.27-32, 2003
  14. C.-L. Wu and W.-C. Hsu, 'Enhanced resonant tunneling real-space transfer in ${\delta}-doped$ GaAs/InGaAs gated dualchannel transistors grown by MOCVD,' IEEE Trans. Electron Devices, Vol. 43, pp. 207-212, Feb. 1996 https://doi.org/10.1109/16.481719