International Journal of Precision Engineering and Manufacturing

Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Fabrication of Micro/Nano-patterns using MC-SPL(Mechano-Chemical Scanning Probe Lithography) Process

  • Sung, In-Ha (Dept. of Mechanical Engineering, Graduate School of Yonsei University) ;
  • Kim, Dae-Eun (School of Mechanical Engineering, Yonsei University)
  • Published : 2003.09.01
Download PDF
⟨ Previous Next ⟩

Abstract

In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

Keywords

References

  1. Romankiw, L. T., 'A Path: From Electroplating through Lithographic Masks in Electronics to LIGA in MEMS,' Electrochim. Acta, Vol. 42, pp. 2985-3005, 1997 https://doi.org/10.1016/S0013-4686(97)00146-1
  2. Menz, W., 'LIGA and Related Technologies for Industrial Application,' Sensor. Actuat. A-Phys., Vol. 54, pp. 785-789, 1996 https://doi.org/10.1016/S0924-4247(97)80056-8
  3. Qin, D., Xia, Y., Rogers, J. A., Jackman, R. J., Zhao, X. M., Whitesides, G. M., 'Micro-fabrication, Microstructures and Microsystems,' Top. Curr. Chem., Vol. 194, pp. 1-20, 1998 https://doi.org/10.1007/3-540-69544-3_1
  4. Rogner, A., Eicher, J., Munchmeyer, D., Peters, R. P., Mohr, J., 'The LIGA Technique-What are the New Opportunities,' J. Micromech. Microeng., Vol. 2, pp. 133-140, 1992 https://doi.org/10.1088/0960-1317/2/3/004
  5. McKeown, P. A., 'The Role of Precision Engineering in Manufacturing of the Future,' Ann. CIRP, Vol. 36, pp. 495-501, 1987 https://doi.org/10.1016/S0007-8506(07)60751-3
  6. Taniguchi, N., Nanotechnology, Oxford University Press, New York, 1996
  7. Xia. Y., Whitesides, G. M., 'Soft Lithography,' Angew. Chem. Int. Ed., Vol. 37, pp. 550-575, 1998 https://doi.org/10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G
  8. Schift, H., Jaszewski, R. W., David, C. and Gobrecht, J., 'Nanostructuring of Polymers and Fabrication of Interdigitated Electrodes by Hot Embossing Lithography,' Microelectron. Eng., Vol. 46, pp. 121-124, 1999 https://doi.org/10.1016/S0167-9317(99)00030-1
  9. Gottschalch, F., Hoffmann, T., Torres, C. M. S., Schulz, H. and Scheer, H.-C., 'Polymer Issues in Nanoimprinting Technique,' Solid State Electron., Vol. 43, pp. 1079-1083, 1999 https://doi.org/10.1016/S0038-1101(99)00028-3
  10. Snow, E. S., Campbell, P. M., 'Fabrication of Si Nanostructures with an Atomic Force Microscope,' Appl. Phys. Lett., Vol. 64, pp. 1932-1934, 1994 https://doi.org/10.1063/1.111746
  11. Minne, S. C., Adams, J. D., Yaralioglu, G., Manalis, S. R., Atalar, A., Quate, C. F., 'Centimeter Scale Atomic Force Microscope Imaging and Lithography,' Appl. Phys. Lett, Vol. 73, pp. 1742-1744, 1998 https://doi.org/10.1063/1.122263
  12. Marrian, C. R. K., Perkins, F. K., Brandow, S. L., Koloski, T. S., Dobisz, E. A., Calvert, J. M., 'Low Voltage Electron Beam Lithography in Self-Assembled Ultrathin Films with the Scanning Tunneling Microscope,' Appl. Phys. Lett., Vol. 64, pp. 390-392, 1994 https://doi.org/10.1063/1.111157
  13. Ivanisevic, A., Mirkin, C. A., 'Dip-Pen Nanolithography on Semiconductor Surfaces,' J. Am. Chem. Soc., Vol. 123, pp. 7887-7889, 2001 https://doi.org/10.1021/ja010671c
  14. Lee, J. M., Jin, W. H., Kim, D. E., 'Application of Single Asperity Abrasion Process for Surface Micromachining,' Wear, Vol. 251, pp. 1133-1143, 2001 https://doi.org/10.1016/S0043-1648(01)00756-6
  15. Lee, J. M., Sung, I. H., Kim, D. E., 'Process Development of Precision Surface Micro-machining using Mechanical Abrasion and Chemical Etching,' Microsyst. Technol., Vol. 8, pp. 419-426, 2002 https://doi.org/10.1007/s00542-002-0193-7
  16. Kim, D. E., Yi, J. J., 'Micro-Patterning of Silicon by Frictional Interaction and Chemical Reaction,' J. Tribol.-T. ASME, Vol. 120, No. 2, pp. 353-357, 1998 https://doi.org/10.1115/1.2834434
  17. Jin, W. H., Kim, D. E., 'Selective Removal of Mask by Mechanical Cutting for Micro-patterning of Silicon,' J. of the KSPE, Vol. 16, No. 2, pp. 60-67, 1999
  18. Lee, J. J., Kim, D. E., 'A Novel Micro-machining Technique Using Mechanical and Chemical Methods,' Trans. KSME-A., Vol. 20, No. 10, pp. 3113-3125, 1996
  19. Xia, Y., Zhao, X.-M., Whitesides, G. M., 'Pattern Transfer : Self-Asembled Monolayers as Ultrathin Resists,' Microelectron. Eng., Vol. 32, pp. 255-268, 1996 https://doi.org/10.1016/0167-9317(95)00174-3
  20. Cha, K. H., Kim, D. E., 'Investigation of the Tribological Behavior of Octadecyltrichlorosilane Deposited on Silicon,' Wear, Vol. 251, pp. 1169-1176, 2001 https://doi.org/10.1016/S0043-1648(01)00729-3
  21. Biebuyck, H. A., Larsen, N. B., Delamarche, E. and Michel, B., 'Lithography beyond Light: Microcontact Printing with Monolayer Resists,' IBM J. Res. Develop., Vol. 41, No. 1-2, pp.159-170, 1997 https://doi.org/10.1147/rd.411.0159