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Properties of Yttrium Manganates with MFS Structure Fabricated on Various Substates

MFS 구조로 적층된 Yttrium Manganates의 기판 변화에 따른 특성 연구

  • 강승구 (경기대학교 첨단산업공학부 신소재공학전공)
  • Published : 2003.02.01

Abstract

Effects of substrates and buffer layer upon the formation of crystalline phases and ferroelectricity of $YMnO_3$ thin films were investigated. The hexagonal $YMnO_3$ was easily formed on Si(100) while the mixed phases, hexagonal and orthorhombic $YMnO_3$, on $Pt(111)/TiO_2/SiO_2/Si$ substrate. When the $Y_2O_3$ buffer layer of 70 nm thick was inserted between the substrates and the $YMnO_3,$ the c-axis oriented hexagonal single phase formed on both substrates, Si(100) and $Pt(111)/TiO_2/SiO_2/Si$. The leakage current density of the hexagonal $YMnO_3$ thin films was lower than that consisting of mixed phases, hexagonal and orthorhombic. Furthermore the hexagonal $YMnO_3$ with c-axis preferred orientation showed the lowest leakage current density. The remnant polarization from a P-E hysteresis curve for the $YMnO_3$ formed on Si(100) was 0.14 without buffer layer and $0.24_{mu}C/cm^2$ for that with buffer layer. For the $Pt(111)/TiO_3/SiO_3/Si$ substrates, the specimen without $Y_2O_3$buffer layer did not show the hysteresis curve, while the buffer-layered has the remnant polarization of $1.14_{mu}C/cm^2$. It was concluded that the leakage current density and the ferroelectricity for the $YMnO_3$ thin films could be controlled by varying crystalline phases and their preferred orientation which depend on the kind of substrates and whether the $Y_2O_3$buffer layer exist or not.

Sol-gel 공정으로 제조된 YMnO$_3$박막의 결정상과 강유전특성에 미치는 기판종류와 버퍼층의 영향에 대하여 고찰하였다. Si(1OO) 기판위에는 hexagonal YMnO$_3$이 형성되었으나 Pt(111)/TiO$_2$/SiO$_2$/Si 기판위에는 hexagonal과 orthorhombic YMnO$_3$이 함께 형성되었다. 기판위에 미리 $Y_2$O$_3$버퍼층을 형성시킨 경우에는 Si(100)와 Pt(111)/TiO$_2$/SiO$_2$/Si 두가지 기판 모두 단일 hexagonal YMnO$_3$이 성장하였으며, 특히 c-축 배향성이 향상되었다. 박막내에 hexagonal과 orthorhombic YMnO$_3$이 혼재된 시편보다는 hexagonal 단일상이 형성된 시편이, 또한 단일상 시편중에서도 c-축 우선배향성이 좋은 시편이 그렇지 않은 시편에 비해 누설전류밀도 특성이 우수하였다. YMnO$_3$박막의 잔류분극값은 Si(100)기판을 사용했을 경우, 버퍼층 없이 제조된 시편은 0.14, 버퍼층이 삽입된 시편은 0.24$\mu$C/$ extrm{cm}^2$의 값을 나타내었다 한편 Pt(111)/TiO$_2$/SiO$_2$/Si 기판의 경우, 버퍼층 없이 형성된 YMnO$_3$시편은 이력곡선을 보여주지 못하였고, 버퍼층이 삽입된 시편은 1.14$\mu$C/$\textrm{cm}^2$의 잔류분극값을 나타내었다. 이상의 연구를 통하여 기판의 종류와 $Y_2$O$_3$버퍼층 삽입으로 YMnO$_3$박막의 결정상과 배향성을 제어함으로서 박막시편의 누설전류밀도 특성 및 강유전특성을 제어할 수 있음을 확인하였다.

Keywords

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