Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Microstructure and Thermal Stability of High Permittivity Ta2O5

Ta2O5 고유전박막의 미세조직과 열적안정성

  • Min, Seok-Hong (Dept. of Metal and Materials Engineering, Kangnung National University) ;
  • Jung, Byung-Gil (Dept. of Metal and Materials Engineering, Kangnung National University) ;
  • Choi, Jae-Ho (Dept. of Metal and Materials Engineering, Kangnung National University) ;
  • Kim, Byoung-Sung (School of Materials Science and Engineering, Seoul National Univeristy) ;
  • Kim, Dae-Yong (School of Materials Science and Engineering, Seoul National Univeristy) ;
  • Shin, Dong-Woo (School of Materials Science and Engineering, Seoul National Univeristy) ;
  • Cho, Sung-Lae (School of Materials Science and Engineering, Seoul National Univeristy) ;
  • Kim, Ki-Bum (School of Materials Science and Engineering, Seoul National Univeristy)
  • 민석홍 (강릉대학교 금속재료공학과) ;
  • 정병길 (강릉대학교 금속재료공학과) ;
  • 최재호 (강릉대학교 금속재료공학과) ;
  • 김병성 (서울대학교 재료공학부) ;
  • 김대용 (서울대학교 재료공학부) ;
  • 신동우 (서울대학교 재료공학부) ;
  • 조성래 (서울대학교 재료공학부) ;
  • 김기범 (서울대학교 재료공학부)
  • Published : 2002.10.01
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Abstract

TiN and TaN films as electrode materials of reactive sputtered $Ta_2$$O_{5}$ were prepared by sputtering to compare their thermal stabilities with $Ta_2$$O_{5}$ The microstructural change of $Ta_2$$O_{5}$ films with annealing was also investigated. As- deposited $Ta_2$$O_{5}$ film on $SiO_2$ was amorphous and annealing of 80$0^{\circ}C$ for 30 min made it transform to $\beta$-Ta$_2$O$_{5}$ crystalline which contains amorphous particles with the size of a few nm. Crystallization temperature of Ta$_2$Ta_2$$O_{5}$ on TaN is higher than that on TiN electrode. The interface between TaN and Ta$_2$O$_{5}$ maintained stably even after vacuum annealing up to $800^{\circ}C$ for 1 hr, but TiN interacted with $Ta_2$$_O{5}$ and so interdiffusion between TiN and $Ta_2$$O_{5}$ occurred by vacuum annealing of 80$0^{\circ}C$ for 1 hr. It indicates that TaN is thermally more stable with $Ta_2$$O_{5}$ than TiN.N.

Keywords

References

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