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Fabrication of the thermopile using SOI structure

SOI 구조를 이용한 열전쌍열(Thermopile) 제작

  • Lee, Young-Tae (Electronics Engineering Education, Andong National University) ;
  • Takao, Hidekuni (Department of Electrical and Electronic Engineering, Toyohashi University of Technology) ;
  • Ishida, Makoto (Department of Electrical and Electronic Engineering, Toyohashi University of Technology)
  • 이영태 (안동대학교 전기전자공학교육과) ;
  • ;
  • Published : 2002.01.31

Abstract

In this paper, a thermopile which is applied to wide uses of temperature measuring was fabricated and its characteristic was improved by appling SOI structure to the fabrication. We improved characteristic of the thermopile by using single crystal silicon strips that has high seebeck coefficient and dielectric isolating the silicon strips from substrate with silicon dioxide film which dramatically decrease thermal conductivity between hot and cold junction compared to a silicon strip which was fabricated by ion implantation. The thermopile consists of 17 p-type single crystal silicon strips and 17 n-types by serial connection. The result of electromotive force measuring showed very good characteristic as 130mV/K when temperature difference between the two ends of the thermopile occurs by applying light on the thermopile fabricated with silicon strips of $1600{\mu}m$ length, $40{\mu}m$ width, $1{\mu}m$ thickness.

온도 측정이 필요한 다양한 용도의 소자에 응용되고 있는 열전쌍열(thermopile) 제작에 SOI 구조를 응용하여, 특성을 개선하였다. 열전쌍열을 구성하는 저항체가 단결정 실리콘으로, 제벡 계수(seebeck coefficient)가 높은 재료일 뿐 아니라, 실리콘 저항체를 산화막을 이용하여 실리콘 기판과 절연 분리한 구조로 되어있어서, 기존의 이온주입 공정에 의해 불순물을 주입하는 방법으로 제작된 저항체에 비해서 두 접점(hot junction 및 cold junction) 사이의 열 전달을 극적으로 감소시킬 수 있어서 소자의 특성을 개선할 수 있었다. 열전쌍열은 p형 단결정 실리콘 저항체 17개 및 n형 17개를 직렬 연결로 구성했다. 저항체의 길이 $1600{\mu}m$, 폭 $40{\mu}m$, 두께 $1{\mu}m$으로 제작된 열전쌍열에 빛을 조사하여 소자 양단에 온도차를 발생시키고, 그 때 발생하는 기전력을 측정한 결과 130mV/K의 우수한 특성을 나타냈다.

Keywords

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